CN1305880A - 具有提高刀刃韧度并减小摩擦的纳米晶cvd涂层的涂覆刀体 - Google Patents
具有提高刀刃韧度并减小摩擦的纳米晶cvd涂层的涂覆刀体 Download PDFInfo
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Abstract
本发明公开了一种具有Ti(C,N,O)纳米晶CVD涂层的涂覆刀体。涂层用MTCVD工艺形成,并且气体混合物的一部分为CO、CO2或其混合物。在涂覆过程中采用这种添加剂可以得到小得多的、等轴粒径。另外,还公开了形成涂覆刀体的方法。
Description
本发明涉及一种涂覆有纳米晶涂层的涂覆刀体及其制备方法。
金属切削中采用涂覆刀体是广为人知的。通常,刀体由硬质合金、金属陶瓷或陶瓷制得,而涂层则是一种或多种第ⅥB族金属的碳化物、氮化物、氧化物或其混合物。例如,涂覆有TiC层、Al2O3层和TiN层的硬质合金刀体被广泛采用。涂层的组成和厚度可以有多种变化,进行涂覆的方法也有多种,如CVD法(化学气相淀积法)和PVD法(物相气相淀积法),其中CVD法可以在约900℃至1250℃的常规温度下进行,也可以在约700℃至900℃的中温下进行,即中温化学气相淀积法(MTCVD)。
CVD法的TiC涂层一般由等轴粒子构成,粒径为约0.5微米至1.0微米。CVD法的TiN涂层以及MTCVD法的Ti(C,N)涂层则由柱状粒子构成,粒子的长度接近涂层的厚度。CVD法涂层的形貌可用工艺条件调控稍作改善,但MTCVD法涂层很难用常规的工艺调控进行改善。
一般来说,多晶材料的硬度(也包括涂层)服从Hall-Petch方程:H=H°+C/√d,式中H是多晶材料的硬度,H°是单晶的硬度,C是材料常数,d是粒径。从该方程式可以看到,降低粒径,可以提高材料的硬度。然而,常规CVD涂层和MTCVD涂层中粒径至少为0.5微米或更高。MTCVD涂层更是具有大柱状粒子的特点,其晶粒长度接近涂层的厚度。
美国再公告专利31,526中指出,在形成Al2O3涂层时,使用添加剂如四价钛、铪和/或锆的化合物,可以促使形成一种特定的相态。另外,美国专利4,619,886中公开了使用选自硫、硒、碲、磷、砷、锑、铋和其混合物的添加剂,可以提高CVD涂覆Al2O3的生长速率,同时还会促使形成均匀的涂层。
CO2也同样被用于部分涂覆工艺中。具体地讲,它被用于氧化工艺中,在这类工艺中,CO2与H2反应形成H2O,即氧化性的气体。如可参阅美国专利5,827,570。
本发明的目的之一就是要避免或减轻现有技术中的问题。
本发明的另一个目的就是提供一种涂层,该涂层具有显著较小的粒径和伴生硬度。
一方面,本发明提供了一种具有涂层的涂覆刀体,所说的涂层为粒径25nm或更小的Ti(C,N,O)涂层。
另一方面,本发明提供了一种制备涂覆有Ti(C,N,O)的刀体的方法,其包括将刀体与含有卤化钛、氮化合物、碳化合物、还原剂以及CO和/或CO2的添加剂的气体接触,使得足以形成粒径小于25nm的Ti(C,N,O)。
已经发现,对于MTCVD法涂覆的涂层,在MTCVD工艺中,向涂覆气体中加入少量的CO或CO2或其混合物、优选CO作添加剂,可以使涂层的粒径变得小得多,并形式等轴形状的粒子。为了使所得涂层的粒径在25nm数量级或更低,优选10nm或更低,MTCVD气体混合物中的CO量应当占气体混合物总量的约5%至10%,优选为约7%至9%。如果采用CO2,则其应当占气体混合物总量的约0.5%至1.0%,优选0.4%至0.6%。CO和/或CO2添加剂可以在反应的任何时候加入,加入方式可以是连续的,也可以是间断的。如果使用CO2和/或CO/CO2混合物,工匠们就应当小心,以避免形成Magnelli相。
尽管上述添加剂可以加入到形成各种涂层的反应物气体混合物中,但发现其在形成Ti(C,N,O)涂层时特别有用,而在此如果没有上述添加剂,则会形成Ti(C,N)涂层。在Ti(C,N,O)涂层中,各组份的比例一般如下:O/Ti,0.1-0.40,优选0.20-0.30;C/Ti,约0.40-0.60,优选0.50-0.60;N/Ti,约0.15-0.35,优选0.20-0.30。虽然本发明的方法优选用于形成Ti(C,N,O)涂层,但也可以用于涂覆Ti(C,O)涂层,而此处如果没有上述添加剂,则会形成TiC涂层。
纳米晶层既可以作为最外层涂覆,也可以作为内层涂覆。从下面可以看到,纳米晶涂层更为坚硬,但在较高温度下(较高的切削速度下)晶粒边界发生滑动,导致塑性变形。由于这种涂层的粒径极小,其表面光滑度增加,摩擦系数减小。因而,纳米晶涂层显然可以起到降低摩擦/润滑层的作用,并应当沉积在现有涂层结构的最顶层上。然而,具有交替纳米晶层的MTCVD/CVD的涂层(在MTCVD/CVD工艺中使用添加开关ON/OFF,有可能形成MTCVD纳米层结构/纳米晶层)应当显示出众的/新的性质。纳米晶层可以与其它的涂层材料一起使用,如与氧化铝(κ或α)或其它氧化物或TiN形成由MTCVD层和纳米粒子层构成的纳米层结构。当优选使用主要为Ti(C,N)的涂层时,***在MTCVD涂层中的非常薄的纳米晶层可以用来控制MTCVD涂层的粒径。如果纳米晶层用作最外层,那么它可以涂覆于Al2O3层上,而Al2O3层本身又可以涂覆于一层或多层的其它层之上,例如TiC层之上。Al2O3层可以是α-相、κ-相,或者是α-相和κ-相Al2O3的混合物。纳米晶层也可以涂覆于TiN层之上。
类似地,如果纳米晶层用作内层时,可以用其它的层如Al2O3、TiC、Ti(C,N),TiN或类似物的层涂覆于纳米晶层之上。
这些各种其它的内层和/或外层可以用CVD法、MTCVD法或PVD法涂覆。
等轴的意思是指粒子在所有的方向上具有基本上相同的尺寸。
另外,结合下面的实施例来说明本发明。这些实施例只是用来解释本发明,然而应当理解,本发明并非局限于这些实施例的特定细节。实施例1
在这种情况下使用CO添加剂。根据表1中的工艺数据,在65毫巴的压力下,制备下列五个实验涂层(叫做涂层1,2,3,4和5)。
表1
粒径
H2(升/分) | N2(升/分) | CH3CN(升/分) | TiCl4(升/分) | CO% | |
涂层1 | 其余 | 25 | 0.5 | 2 | 0 |
涂层2 | 其余 | 25 | 0.5 | 2 | 3 |
涂层3 | 其余 | 25 | 0.5 | 2 | 4 |
涂层4 | 其余 | 25 | 0.5 | 2 | 6 |
涂层5 | 其余 | 25 | 0.5 | 2 | 8 |
涂层1-5用透射电子显微镜(TEM)进行研究,以便搞清CO的添加对粒径的影响。看起来很清楚,添加CO,使得由大柱状晶粒构成的MTCVD Ti(C,N)涂层的微观结构发生强烈细化。当CO添加量达到约8%时,其结构变为纳米晶。X-射线衍时(XRD)
用XRD研究涂层1、3、4和5。晶粒细化可清楚地用线展宽来表示。表2中给出了线展宽的数据及观察到的粒径。
表2
CO% | FWHM*(2θ°) | 线展宽(Bn/B0) | 晶粒形状 | 粒径(nm) |
0.0 | 1.50(B0) | 1.0 | 柱状 | 250** |
4.0 | 0.209 | 1.39 | 柱状 | 150** |
6.0 | 0.330 | 2.20 | 柱状/等轴 | 50*** |
8.0 | 0.359(Bn) | 2.39 | 等轴 | 10 |
*半峰宽度,由单一MTCVD Ti(C,N)涂层的220反射面的Kα2分解高斯线测得。
**柱状晶粒的平均宽度。注意其长度通常在涂层厚度的数量级。
***柱状晶粒和等轴晶粒的混合物。没有发现接近涂层厚度的柱状晶粒。
参比样的半峰宽度为B0。
纳米晶涂层参比样的半峰宽度为Bn(n=4.0,6.0,8.0)。
线展宽为Bn/B0。
线展宽可以用绝对值(°2θ)来定义,也可以用相对值来定义。线展宽应当为0.30-0.60°2θ,优选为0.33-0.4°2θ,或者应当为2.0-4.0,优选为2.2-2.7(相对值,参比样为MTCVD Ti(C,N))。
在这种情况下,线展宽两种定义的特征是涂层处于轻微的拉伸应力下。因而线展宽只与粒径有关,而与压缩应力无关,如在PVD涂层中较小的粒径所出现的压缩压力。硬度
涂层1,3,4,5的硬度用纳米硬度计技术测量。结果列于表3中。
表3
涂层化学(掺入氧)
CO% | 硬度 | |
涂层1 | 0 | 26 |
涂层3 | 4.0 | 28 |
涂层4 | 6.0 | 29 |
涂层5 | 8.0 | 34 |
实验表明,通过掺合,可以在涂层中掺入相当量的氧,见表4。很清楚涂层中碳组份是主要的,其不受CO添加量增加的影响。氮含量减小,而氧组份含量急剧增加。不过没有发现钛的氧化物(Magnelli相)。涂层的化学计量从0.88增至1.03。
表4
摩擦
组份 | 涂层1 | 涂层3 | 涂层4 | 涂层5 |
C/Ti | 0.55 | 0.54 | 0.54 | 0.54 |
N/Ti | 0.33 | 0.28 | 0.24 | 0.21 |
O/Ti | 0.00 | 0.04 | 0.18 | 0.28 |
(C+N+O)/Ti | 0.88 | 0.86 | 0.96 | 1.03 |
用栓钉盘(pin-on disk)技术测定钢(SS1672)和实验涂层之间的摩擦系数。表5证实了摩擦的减小。
表5
CO% | 摩擦系数 | |
涂层1 | 0 | 0.45 |
涂层3 | 4.0 | 0.45 |
涂层4 | 6.0 | 0.41 |
涂层5 | 8.0 | 0.32 |
将涂层1、3、4和5的单个涂层沉积于车刀刀体(SNUN120408)和铣刀刀体(SEKN1203 AFN)上。所有涂层的厚度均为6μm。从表6中可以清楚地看到,单一纳米晶层(涂层5)在较低的车旋切削速度下具有良好的耐磨性能。在较高的切削速度下,由于塑性变形,该涂层不成功,但与没有进行添加的涂层相比(涂层1),其月牙缺口、边层磨损和涂层剥落要明显地少。在铣削操作中(此时为中速),纳米晶涂层(涂层5)具有明显较长的寿命,刀刃强度也得以提高(耐剥落),见表7。
从所得的结果可以清楚地看到,在Ti(C,N)、TiN、TiC、Al2O3或其组合层之上涂覆纳米晶层的组合,会得到明显增强的耐磨性能,特别是考虑到高速车削和铣削耐剥落时。
表6
车削不锈钢(SS 2333) | ||
185m/min下的寿命(min) | 250m/min下的寿命(min) | |
涂层1 | 22 | 16 |
涂层3 | 22 | 17 |
涂层4 | 25 | 14 |
涂层5 | 31 | 9 |
寿命标准:表面磨光或侧边磨损
送进:0.2毫米/齿
切削深度:2.5毫米
表7
铣削(不锈钢SS 2333) | ||
切削长度(毫米) | 剥落% | |
涂层1 | 3400 | 12 |
涂层3 | 3350 | 9 |
涂层4 | 3800 | 9 |
涂层5 | 4200 | 4 |
切削速度:200m/min
送进:0.2毫米/齿
切削深度:2.5毫米
实施例2
在MTCVD法的Ti(C,N)涂层之上和Ti(C,N)-Al2O3复合涂层之上再涂覆纳米晶涂层。涂层的组合见表8。涂层1-4沉积于车刀刀体(SNUN120408)和铣刀刀体(SEKN1203 AFN)上。
表8
Ti(C,N) | Al2O3 | 等轴纳米 | 粒径 | |
涂层1 | 6μm | - | - | - |
涂层2 | 4μm | - | 2 | 10nm |
涂层3 | 4μm | 4μm | - | - |
涂层4 | 4μm | 4μm | 2 | 10nm |
表9
碳钢,SS1672 | ||
185m/min下的寿命(min) | 250m/min下的寿命(min) | |
涂层1 | 25 | 16 |
涂层2 | 28 | 18 |
寿命标准:ISO 3685
表10
不锈钢,SS2333 | ||
220m/min下的寿命(min) | 刀刃剥落(%)** | |
涂层3 | 12* | 22 |
涂层4 | 19 | 8 |
*寿命标准:ISO 3685
**4分钟车削之后
表11
铸铁,SS1672 | ||
220m/min下的寿命(min) | 刀刃剥落(%)** | |
涂层3 | 15* | 16 |
涂层4 | 16 | 11 |
*寿命标准:ISO 3685
**4分钟车削之后
表12
面铣削(SS2377) | ||
切削长度(mm) | 剥落%** | |
涂层1 | 3400* | 20 |
涂层2 | 3350 | 15 |
涂层3 | 3800 | 32 |
涂层4 | 4200 | 16 |
切削速度:80m/min
送进:0.6毫米/齿
切削深度:6毫米
湿铣削
*寿命标准:表面磨光
**1800mm之后
前面的说明书已原则上描述了实施本发明优选的方案和模式。然而,此处要进行保护的范围并不局限于所公开的特定方式,因为这些方式只是用来说明的,而不是用来限制的。本领域的熟练人员完全可以进行改良或改变而不超出本发明的精神。
Claims (31)
1、一种具有涂层的涂覆刀体,所述的涂层是粒径为25nm或更低的Ti(C,N,O)涂层。
2、如权利要求1所述的涂覆碳化物的刀体,其中,所述的Ti(C,N,O)涂层涂覆成最外层。
3、如权利要求2的涂覆刀体,其中,Ti(C,N,O)涂层涂覆于Ti(C,N)层、Ti(Al,N)层、κ-Al2O3层、α-Al2O3层或其混合物层之上。
4、如权利要求3的涂覆刀体,其中,所述的涂层是用MTCVD法涂覆的。
5、如权利要求3的涂覆刀体,其中,所述的Ti(C,N,O)涂层是用MTCVD法涂覆的。
6、如权利要求3的涂覆刀体,其中,所述的Ti(C,N,O)涂层涂覆于Al2O3层之上,而Al2O3层本身又涂覆于Ti(C,N)层之上。
7、如权利要求6的涂覆刀体,其中,所述的Al2O3层是α-Al2O3层。
8、如权利要求6的涂覆刀体,其中,所述的Al2O3层是κ-Al2O3层。
9、如权利要求6的涂覆刀体,其中,所述的Ti(C,N)层是MTCVD法Ti(C,N)层和CVD法Ti(C,N)层的多层结构。
10、如权利要求1的涂覆刀体,其中,所述的Ti(C,N,O)涂层中,O/Ti的比例为0.10-0.40,C/Ti的比例为0.40-0.60,N/Ti的比例为0.15-0.35。
11、如权利要求3的涂覆刀体,其中,Ti(Al,N)层是用PVD法涂覆的。
12、如权利要求3的涂覆刀体,其中,Ti(C,N)层是用PVD法涂覆的。
13、如权利要求1的涂覆刀体,其中,所述的Ti(C,N)层没有压缩应力。
14、如权利要求1的涂覆刀体,其中,所述的Ti(C,N,O)涂层是内层,在其上面至少有一层其它的层。
15、如权利要求14的涂覆刀体,其中,在所述的Ti(C,N,O)涂层之上有外层,该外层包括一层或多层的Al2O3层、Ti(C,N)层和TiN层。
16、如权利要求15的涂覆刀体,其中,所述的外层是TiN层的多层结构。
17、如权利要求15的涂覆刀体,其中,所述的外层是Ti(C,N)层的多层结构。
18、如权利要求15的涂覆刀体,其中,所述的外层是Al2O3层的多层结构。
19、如权利要求18的涂覆刀体,其中,所述的Al2O3层是κ-Al2O3层。
20、如权利要求1的涂覆刀体,其中,所述的刀体包括硬质合金、金属陶瓷或陶瓷。
21、如权利要求2的涂覆刀体,其中,所述涂层的x-射线衍射半峰宽度至少为Ti(C,N)层的两倍。
22、如权利要求21的涂覆刀体,其中,所述涂层的x-射线衍射半峰宽度为Ti(C,N)层的2.25-2.50倍。
23、一种形成具有Ti(C,N,O)涂层的涂覆刀体的方法,包括将刀体与含有卤化钛、氮化合物、碳化合物、还原剂以及CO和/或CO2的添加剂的气体接触,使得足以形成粒径小于25nm的Ti(C,N,O)。
24、如权利要求23的方法,其中,所述的卤化物是四氯化钛。
25、如权利要求24的方法,其中,所述的氮和碳是由同一化合物提供的。
26、如权利要求25的方法,其中,氮和碳的化合物是CH3CN。
27、如权利要求23的方法,其中,所述的添加剂是CO。
28、如权利要求23的方法,其中,所述的添加剂是CO2。
29、如权利要求27的方法,其中,CO占气体混合物总量的5%-10%。
30、如权利要求28的方法,其中,CO2占气体混合物总量的0.5%-1.0%。
31、如权利要求23的方法,其中,所述的涂覆是在700-900℃下进行的。
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US09/487,495 US6472060B1 (en) | 2000-01-19 | 2000-01-19 | Coated body with nanocrystalline CVD coating for enhanced edge toughness and reduced friction |
US09/487,495 | 2000-01-19 |
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US (3) | US6472060B1 (zh) |
EP (1) | EP1118688A1 (zh) |
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Families Citing this family (32)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6472060B1 (en) | 2000-01-19 | 2002-10-29 | Seco Tools Ab | Coated body with nanocrystalline CVD coating for enhanced edge toughness and reduced friction |
US6689450B2 (en) | 2001-03-27 | 2004-02-10 | Seco Tools Ab | Enhanced Al2O3-Ti(C,N) multi-coating deposited at low temperature |
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Family Cites Families (26)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
SE406090B (sv) | 1977-06-09 | 1979-01-22 | Sandvik Ab | Belagd hardmetallkropp samt sett att framstalla en dylik kropp |
US4619866A (en) | 1980-07-28 | 1986-10-28 | Santrade Limited | Method of making a coated cemented carbide body and resulting body |
KR880002518B1 (ko) * | 1981-07-15 | 1988-11-26 | 미다가쓰시께 | 방사선 감응성 조성물 |
US4449052A (en) * | 1981-11-30 | 1984-05-15 | International Business Machines Corporation | Method of printing and detecting optimum bar code test patterns |
JPS60238481A (ja) * | 1984-05-14 | 1985-11-27 | Sumitomo Electric Ind Ltd | 多重層被覆超硬合金 |
JP3136778B2 (ja) * | 1992-06-11 | 2001-02-19 | 三菱マテリアル株式会社 | 耐チッピング性にすぐれた表面被覆炭窒化チタン基サーメット製切削工具 |
JP3052586B2 (ja) | 1992-06-25 | 2000-06-12 | 三菱マテリアル株式会社 | 耐チッピング性にすぐれた表面被覆炭化タングステン基超硬合金製切削工具 |
EP0592986B1 (en) * | 1992-10-12 | 1998-07-08 | Sumitomo Electric Industries, Limited | Ultra-thin film laminate |
US5374471A (en) | 1992-11-27 | 1994-12-20 | Mitsubishi Materials Corporation | Multilayer coated hard alloy cutting tool |
JPH06279990A (ja) * | 1993-03-30 | 1994-10-04 | Sumitomo Electric Ind Ltd | 耐摩耗性被膜とその形成方法 |
DE69431032T2 (de) * | 1993-05-31 | 2003-01-30 | Sumitomo Electric Industries, Ltd. | Beschichtetes schneidwerkzeug und verfahren zu dessen herstellung |
SE514737C2 (sv) | 1994-03-22 | 2001-04-09 | Sandvik Ab | Belagt skärverktyg av hårdmetall |
CA2149567C (en) | 1994-05-31 | 2000-12-05 | William C. Russell | Coated cutting tool and method of making same |
JP3119414B2 (ja) | 1994-05-31 | 2000-12-18 | 三菱マテリアル株式会社 | 硬質被覆層がすぐれた層間密着性を有する表面被覆炭化タングステン基超硬合金製切削工具 |
EP0701982B1 (en) | 1994-09-16 | 2002-07-03 | Sumitomo Electric Industries, Limited | Layered film made of ultrafine particles and a hard composite material for tools possessing the film |
JPH08206902A (ja) * | 1994-12-01 | 1996-08-13 | Sumitomo Electric Ind Ltd | 切削用焼結体チップおよびその製造方法 |
JP3250414B2 (ja) | 1995-03-29 | 2002-01-28 | 三菱マテリアル株式会社 | チタンの炭窒酸化物層表面被覆切削工具の製造方法 |
EP0784103B1 (en) * | 1996-01-10 | 2003-04-09 | Mitsubishi Materials Corporation | Method of manufacturing coated cutting tools |
US5813962A (en) | 1996-06-28 | 1998-09-29 | Kawasaki Steel Corporation | Forged roll for rolling a seamless steel pipe |
JP3418066B2 (ja) | 1996-07-03 | 2003-06-16 | 日立金属株式会社 | アルミナ被覆工具とその製造方法 |
JP3402146B2 (ja) * | 1997-09-02 | 2003-04-28 | 三菱マテリアル株式会社 | 硬質被覆層がすぐれた密着性を有する表面被覆超硬合金製エンドミル |
IL130803A (en) * | 1997-11-06 | 2002-12-01 | Sumitomo Electric Industries | Coated carbide cutting tool |
ATE221140T1 (de) | 1998-07-08 | 2002-08-15 | Widia Gmbh | Hartmetall- oder cermet-körper und verfahren zu seiner herstellung |
US6221469B1 (en) * | 1998-12-09 | 2001-04-24 | Seco Tools Ab | Grade for steel |
US6251508B1 (en) * | 1998-12-09 | 2001-06-26 | Seco Tools Ab | Grade for cast iron |
US6472060B1 (en) | 2000-01-19 | 2002-10-29 | Seco Tools Ab | Coated body with nanocrystalline CVD coating for enhanced edge toughness and reduced friction |
-
2000
- 2000-01-19 US US09/487,495 patent/US6472060B1/en not_active Expired - Fee Related
-
2001
- 2001-01-04 EP EP01850003A patent/EP1118688A1/en not_active Withdrawn
- 2001-01-18 KR KR1020010002811A patent/KR100759073B1/ko not_active IP Right Cessation
- 2001-01-18 JP JP2001010232A patent/JP2001234344A/ja active Pending
- 2001-01-19 CN CNB011030364A patent/CN1262391C/zh not_active Expired - Fee Related
- 2001-08-08 US US09/923,968 patent/US6652913B2/en not_active Expired - Fee Related
-
2002
- 2002-08-19 US US10/222,810 patent/US6620498B2/en not_active Expired - Fee Related
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN100554538C (zh) * | 2004-01-19 | 2009-10-28 | 里特机械公司 | 精梳机棉网引导装置 |
CN110678579A (zh) * | 2017-06-20 | 2020-01-10 | 山特维克知识产权股份有限公司 | 涂层切削工具 |
CN110678579B (zh) * | 2017-06-20 | 2021-12-10 | 山特维克知识产权股份有限公司 | 涂层切削工具 |
Also Published As
Publication number | Publication date |
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EP1118688A1 (en) | 2001-07-25 |
KR100759073B1 (ko) | 2007-09-19 |
JP2001234344A (ja) | 2001-08-31 |
US6652913B2 (en) | 2003-11-25 |
US20030054159A1 (en) | 2003-03-20 |
CN1262391C (zh) | 2006-07-05 |
US6620498B2 (en) | 2003-09-16 |
US6472060B1 (en) | 2002-10-29 |
US20020012818A1 (en) | 2002-01-31 |
KR20010074518A (ko) | 2001-08-04 |
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