CN112566879A - 红外线吸收玻璃的制造方法 - Google Patents

红外线吸收玻璃的制造方法 Download PDF

Info

Publication number
CN112566879A
CN112566879A CN201980053301.1A CN201980053301A CN112566879A CN 112566879 A CN112566879 A CN 112566879A CN 201980053301 A CN201980053301 A CN 201980053301A CN 112566879 A CN112566879 A CN 112566879A
Authority
CN
China
Prior art keywords
glass
producing
treatment
infrared
absorbing glass
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201980053301.1A
Other languages
English (en)
Chinese (zh)
Inventor
片山裕贵
坂出喜之
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Electric Glass Co Ltd
Original Assignee
Nippon Electric Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Glass Co Ltd filed Critical Nippon Electric Glass Co Ltd
Publication of CN112566879A publication Critical patent/CN112566879A/zh
Pending legal-status Critical Current

Links

Images

Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C23/00Other surface treatment of glass not in the form of fibres or filaments
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B11/00Cleaning flexible or delicate articles by methods or apparatus specially adapted thereto
    • B08B11/04Cleaning flexible or delicate articles by methods or apparatus specially adapted thereto specially adapted for plate glass, e.g. prior to manufacture of windshields
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04Cleaning involving contact with liquid
    • B08B3/10Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/12Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B9/00Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor
    • B24B9/02Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground
    • B24B9/06Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain
    • B24B9/08Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain of glass
    • B24B9/10Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain of glass of plate glass
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C19/00Surface treatment of glass, not in the form of fibres or filaments, by mechanical means
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C23/00Other surface treatment of glass not in the form of fibres or filaments
    • C03C23/0075Cleaning of glass
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00Glass compositions
    • C03C3/12Silica-free oxide glass compositions
    • C03C3/16Silica-free oxide glass compositions containing phosphorus
    • C03C3/17Silica-free oxide glass compositions containing phosphorus containing aluminium or beryllium
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00Glass compositions
    • C03C3/12Silica-free oxide glass compositions
    • C03C3/23Silica-free oxide glass compositions containing halogen and at least one oxide, e.g. oxide of boron
    • C03C3/247Silica-free oxide glass compositions containing halogen and at least one oxide, e.g. oxide of boron containing fluorine and phosphorus
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C4/00Compositions for glass with special properties
    • C03C4/08Compositions for glass with special properties for glass selectively absorbing radiation of specified wave lengths
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C4/00Compositions for glass with special properties
    • C03C4/08Compositions for glass with special properties for glass selectively absorbing radiation of specified wave lengths
    • C03C4/082Compositions for glass with special properties for glass selectively absorbing radiation of specified wave lengths for infrared absorbing glass
    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/43Solvents
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • G02B5/22Absorbing filters

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Organic Chemistry (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Wood Science & Technology (AREA)
  • Ceramic Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Surface Treatment Of Glass (AREA)
  • Optical Filters (AREA)
  • Glass Compositions (AREA)
CN201980053301.1A 2018-09-20 2019-08-26 红外线吸收玻璃的制造方法 Pending CN112566879A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2018175864 2018-09-20
JP2018-175864 2018-09-20
PCT/JP2019/033273 WO2020059431A1 (ja) 2018-09-20 2019-08-26 赤外線吸収ガラスの製造方法

Publications (1)

Publication Number Publication Date
CN112566879A true CN112566879A (zh) 2021-03-26

Family

ID=69887203

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201980053301.1A Pending CN112566879A (zh) 2018-09-20 2019-08-26 红外线吸收玻璃的制造方法

Country Status (4)

Country Link
JP (1) JP7452428B2 (ja)
KR (1) KR20210060531A (ja)
CN (1) CN112566879A (ja)
WO (1) WO2020059431A1 (ja)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2021172574A (ja) * 2020-04-30 2021-11-01 日本電気硝子株式会社 ガラス板の前処理方法及びガラス物品の製造方法

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004083290A (ja) * 2002-07-05 2004-03-18 Hoya Corp 近赤外光吸収ガラス、近赤外光吸収素子、近赤外光吸収フィルターおよび近赤外光吸収ガラス成形体の製造方法
CN1939856A (zh) * 2005-09-29 2007-04-04 Hoya株式会社 透镜,近红外线吸收玻璃批及其制造方法
CN102603189A (zh) * 2012-02-17 2012-07-25 成都光明光电股份有限公司 近红外光吸收玻璃、元件及滤光器
JP2014083504A (ja) * 2012-10-24 2014-05-12 Ohara Inc 光触媒部材及びその製造方法
CN104797540A (zh) * 2012-11-30 2015-07-22 Hoya株式会社 玻璃物品
JP2016059973A (ja) * 2014-09-16 2016-04-25 旭硝子株式会社 研磨スラリーの再生方法、基板の製造方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6583609B2 (ja) 2015-04-10 2019-10-02 日本電気硝子株式会社 近赤外線吸収ガラス
JP6811053B2 (ja) 2016-04-11 2021-01-13 日本電気硝子株式会社 赤外線吸収ガラス板及びその製造方法、並びに固体撮像素子デバイス
JP2019055889A (ja) 2017-09-20 2019-04-11 日本電気硝子株式会社 赤外線吸収ガラス板及びその製造方法、並びに固体撮像素子デバイス

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004083290A (ja) * 2002-07-05 2004-03-18 Hoya Corp 近赤外光吸収ガラス、近赤外光吸収素子、近赤外光吸収フィルターおよび近赤外光吸収ガラス成形体の製造方法
CN1939856A (zh) * 2005-09-29 2007-04-04 Hoya株式会社 透镜,近红外线吸收玻璃批及其制造方法
CN102603189A (zh) * 2012-02-17 2012-07-25 成都光明光电股份有限公司 近红外光吸收玻璃、元件及滤光器
JP2014083504A (ja) * 2012-10-24 2014-05-12 Ohara Inc 光触媒部材及びその製造方法
CN104797540A (zh) * 2012-11-30 2015-07-22 Hoya株式会社 玻璃物品
JP2016059973A (ja) * 2014-09-16 2016-04-25 旭硝子株式会社 研磨スラリーの再生方法、基板の製造方法

Also Published As

Publication number Publication date
WO2020059431A1 (ja) 2020-03-26
KR20210060531A (ko) 2021-05-26
JPWO2020059431A1 (ja) 2021-09-09
JP7452428B2 (ja) 2024-03-19

Similar Documents

Publication Publication Date Title
KR101520917B1 (ko) 웨이퍼의 표면 처리용 텍스쳐링 및 세정제 및 그것의 사용
EP1845555B1 (en) Post chemical-mechanical planarization (cmp) cleaning composition
US9365802B2 (en) Cleaning liquid for semiconductor device substrates and method of cleaning substrate for semiconductor devices
US4116714A (en) Post-polishing semiconductor surface cleaning process
CN101062503A (zh) 化学机械研磨后的晶片清洗方法
KR20120089570A (ko) 세정액 및 세정 방법
TWI524411B (zh) Iii-v族化合物半導體晶圓及其清洗方法
KR101153200B1 (ko) 피라미드 구조를 갖는 실리콘 표면의 제조방법
US20120021961A1 (en) Composition for post chemical-mechanical polishing cleaning
DE10046933C2 (de) Verfahren zur Politur von Siliciumscheiben
CN112566879A (zh) 红外线吸收玻璃的制造方法
TW201700188A (zh) 矽晶圓的洗淨方法
KR101643124B1 (ko) 웨이퍼용 세정수 및 웨이퍼의 세정 방법
JP3957268B2 (ja) 半導体基板の洗浄方法
US20150290765A1 (en) Substrate processing method
US20080223414A1 (en) Compositions and methods for removing titanium dioxide from surfaces
JPS62182291A (ja) アルミニウムの洗浄方法
US11177125B2 (en) Method for cleaning semiconductor wafer
EP2031096A2 (de) Verfahren zur Reinigung von Oberflächen sowie Verwendung des Verfahrens
CN117862112A (zh) 一种半导体硅抛光片的去蜡清洗工艺
JP2007235036A (ja) シリコンウエハの親水化処理方法及びそれに用いる親水化処理剤
CN109037032A (zh) 一种光电子半导体硅片脱胶工艺
CN117660119A (zh) 水晶玻璃清洗剂及清洗方法
CN116274128A (zh) 硒化锌镜片表面瑕疵的处理方法
DE102010063178B4 (de) Verfahren zur Reinigung einer Halbleiterscheibe aus Silizium unmittelbar nach einer Politur der Halbleiterscheibe

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination