CN112540511B - 载置台装置、光刻装置以及物品制造方法 - Google Patents
载置台装置、光刻装置以及物品制造方法 Download PDFInfo
- Publication number
- CN112540511B CN112540511B CN202010964290.7A CN202010964290A CN112540511B CN 112540511 B CN112540511 B CN 112540511B CN 202010964290 A CN202010964290 A CN 202010964290A CN 112540511 B CN112540511 B CN 112540511B
- Authority
- CN
- China
- Prior art keywords
- stage
- electromagnetic actuator
- movement stage
- substrate
- thrust
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Links
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 17
- 238000000034 method Methods 0.000 claims abstract description 19
- 239000000758 substrate Substances 0.000 claims description 41
- 238000012545 processing Methods 0.000 claims description 5
- 230000008569 process Effects 0.000 claims description 4
- 239000000696 magnetic material Substances 0.000 claims description 3
- 230000005291 magnetic effect Effects 0.000 description 33
- 230000004907 flux Effects 0.000 description 25
- 238000010586 diagram Methods 0.000 description 19
- 238000011156 evaluation Methods 0.000 description 10
- 230000001133 acceleration Effects 0.000 description 6
- 230000006870 function Effects 0.000 description 5
- 238000001514 detection method Methods 0.000 description 4
- 229920002120 photoresistant polymer Polymers 0.000 description 4
- 230000009471 action Effects 0.000 description 2
- 239000000470 constituent Substances 0.000 description 2
- 238000005286 illumination Methods 0.000 description 2
- 230000003993 interaction Effects 0.000 description 2
- 238000001459 lithography Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000003302 ferromagnetic material Substances 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 230000002452 interceptive effect Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 238000002039 particle-beam lithography Methods 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 230000010349 pulsation Effects 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
- G03F7/70725—Stages control
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2019-171846 | 2019-09-20 | ||
JP2019171846A JP7389597B2 (ja) | 2019-09-20 | 2019-09-20 | ステージ装置、リソグラフィ装置、および物品製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN112540511A CN112540511A (zh) | 2021-03-23 |
CN112540511B true CN112540511B (zh) | 2024-03-12 |
Family
ID=74876629
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN202010964290.7A Active CN112540511B (zh) | 2019-09-20 | 2020-09-15 | 载置台装置、光刻装置以及物品制造方法 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP7389597B2 (ja) |
KR (1) | KR20210034489A (ja) |
CN (1) | CN112540511B (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2022147223A (ja) | 2021-03-23 | 2022-10-06 | 大塚電子株式会社 | 光学測定システム、光学測定方法および測定プログラム |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001175332A (ja) * | 1999-12-22 | 2001-06-29 | Nikon Corp | ステージの駆動方法、ステージ装置及び露光装置 |
JP2006173500A (ja) * | 2004-12-17 | 2006-06-29 | Nikon Corp | アクチュエータ、ステージ装置、露光装置及びデバイスの製造方法 |
WO2010131485A1 (ja) * | 2009-05-15 | 2010-11-18 | 株式会社ニコン | 移動体装置、用力伝達装置、及び露光装置、並びにデバイス製造方法 |
CN102645850A (zh) * | 2011-02-22 | 2012-08-22 | Asml荷兰有限公司 | 电磁致动器、平台设备以及光刻设备 |
JP2014192254A (ja) * | 2013-03-26 | 2014-10-06 | Canon Inc | ステージ装置、リソグラフィ装置及びデバイス製造方法 |
JP2019121656A (ja) * | 2017-12-28 | 2019-07-22 | キヤノン株式会社 | 制御方法、制御装置、リソグラフィ装置、および物品の製造方法 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006211873A (ja) * | 2005-01-31 | 2006-08-10 | Canon Inc | 移動体制御装置及び移動体制御方法 |
JP6576111B2 (ja) * | 2015-06-12 | 2019-09-18 | キヤノン株式会社 | 駆動システム、モータの制御方法、リソグラフィ装置および物品製造方法 |
-
2019
- 2019-09-20 JP JP2019171846A patent/JP7389597B2/ja active Active
-
2020
- 2020-09-01 KR KR1020200110821A patent/KR20210034489A/ko not_active Application Discontinuation
- 2020-09-15 CN CN202010964290.7A patent/CN112540511B/zh active Active
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001175332A (ja) * | 1999-12-22 | 2001-06-29 | Nikon Corp | ステージの駆動方法、ステージ装置及び露光装置 |
JP2006173500A (ja) * | 2004-12-17 | 2006-06-29 | Nikon Corp | アクチュエータ、ステージ装置、露光装置及びデバイスの製造方法 |
WO2010131485A1 (ja) * | 2009-05-15 | 2010-11-18 | 株式会社ニコン | 移動体装置、用力伝達装置、及び露光装置、並びにデバイス製造方法 |
CN102645850A (zh) * | 2011-02-22 | 2012-08-22 | Asml荷兰有限公司 | 电磁致动器、平台设备以及光刻设备 |
JP2014192254A (ja) * | 2013-03-26 | 2014-10-06 | Canon Inc | ステージ装置、リソグラフィ装置及びデバイス製造方法 |
JP2019121656A (ja) * | 2017-12-28 | 2019-07-22 | キヤノン株式会社 | 制御方法、制御装置、リソグラフィ装置、および物品の製造方法 |
Also Published As
Publication number | Publication date |
---|---|
JP7389597B2 (ja) | 2023-11-30 |
KR20210034489A (ko) | 2021-03-30 |
CN112540511A (zh) | 2021-03-23 |
JP2021048379A (ja) | 2021-03-25 |
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