CN112540511B - 载置台装置、光刻装置以及物品制造方法 - Google Patents

载置台装置、光刻装置以及物品制造方法 Download PDF

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Publication number
CN112540511B
CN112540511B CN202010964290.7A CN202010964290A CN112540511B CN 112540511 B CN112540511 B CN 112540511B CN 202010964290 A CN202010964290 A CN 202010964290A CN 112540511 B CN112540511 B CN 112540511B
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CN
China
Prior art keywords
stage
electromagnetic actuator
movement stage
substrate
thrust
Prior art date
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Active
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CN202010964290.7A
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English (en)
Chinese (zh)
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CN112540511A (zh
Inventor
栗原孝史
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
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Canon Inc
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Publication date
Application filed by Canon Inc filed Critical Canon Inc
Publication of CN112540511A publication Critical patent/CN112540511A/zh
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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
CN202010964290.7A 2019-09-20 2020-09-15 载置台装置、光刻装置以及物品制造方法 Active CN112540511B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2019-171846 2019-09-20
JP2019171846A JP7389597B2 (ja) 2019-09-20 2019-09-20 ステージ装置、リソグラフィ装置、および物品製造方法

Publications (2)

Publication Number Publication Date
CN112540511A CN112540511A (zh) 2021-03-23
CN112540511B true CN112540511B (zh) 2024-03-12

Family

ID=74876629

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Country Status (3)

Country Link
JP (1) JP7389597B2 (ja)
KR (1) KR20210034489A (ja)
CN (1) CN112540511B (ja)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2022147223A (ja) 2021-03-23 2022-10-06 大塚電子株式会社 光学測定システム、光学測定方法および測定プログラム

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001175332A (ja) * 1999-12-22 2001-06-29 Nikon Corp ステージの駆動方法、ステージ装置及び露光装置
JP2006173500A (ja) * 2004-12-17 2006-06-29 Nikon Corp アクチュエータ、ステージ装置、露光装置及びデバイスの製造方法
WO2010131485A1 (ja) * 2009-05-15 2010-11-18 株式会社ニコン 移動体装置、用力伝達装置、及び露光装置、並びにデバイス製造方法
CN102645850A (zh) * 2011-02-22 2012-08-22 Asml荷兰有限公司 电磁致动器、平台设备以及光刻设备
JP2014192254A (ja) * 2013-03-26 2014-10-06 Canon Inc ステージ装置、リソグラフィ装置及びデバイス製造方法
JP2019121656A (ja) * 2017-12-28 2019-07-22 キヤノン株式会社 制御方法、制御装置、リソグラフィ装置、および物品の製造方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006211873A (ja) * 2005-01-31 2006-08-10 Canon Inc 移動体制御装置及び移動体制御方法
JP6576111B2 (ja) * 2015-06-12 2019-09-18 キヤノン株式会社 駆動システム、モータの制御方法、リソグラフィ装置および物品製造方法

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001175332A (ja) * 1999-12-22 2001-06-29 Nikon Corp ステージの駆動方法、ステージ装置及び露光装置
JP2006173500A (ja) * 2004-12-17 2006-06-29 Nikon Corp アクチュエータ、ステージ装置、露光装置及びデバイスの製造方法
WO2010131485A1 (ja) * 2009-05-15 2010-11-18 株式会社ニコン 移動体装置、用力伝達装置、及び露光装置、並びにデバイス製造方法
CN102645850A (zh) * 2011-02-22 2012-08-22 Asml荷兰有限公司 电磁致动器、平台设备以及光刻设备
JP2014192254A (ja) * 2013-03-26 2014-10-06 Canon Inc ステージ装置、リソグラフィ装置及びデバイス製造方法
JP2019121656A (ja) * 2017-12-28 2019-07-22 キヤノン株式会社 制御方法、制御装置、リソグラフィ装置、および物品の製造方法

Also Published As

Publication number Publication date
JP7389597B2 (ja) 2023-11-30
KR20210034489A (ko) 2021-03-30
CN112540511A (zh) 2021-03-23
JP2021048379A (ja) 2021-03-25

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