CN110321640A - A kind of domain DRC processing method of integrated circuit conversion process - Google Patents
A kind of domain DRC processing method of integrated circuit conversion process Download PDFInfo
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- CN110321640A CN110321640A CN201910607637.XA CN201910607637A CN110321640A CN 110321640 A CN110321640 A CN 110321640A CN 201910607637 A CN201910607637 A CN 201910607637A CN 110321640 A CN110321640 A CN 110321640A
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- drc
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F30/00—Computer-aided design [CAD]
- G06F30/30—Circuit design
- G06F30/39—Circuit design at the physical level
- G06F30/392—Floor-planning or layout, e.g. partitioning or placement
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F30/00—Computer-aided design [CAD]
- G06F30/30—Circuit design
- G06F30/39—Circuit design at the physical level
- G06F30/398—Design verification or optimisation, e.g. using design rule check [DRC], layout versus schematics [LVS] or finite element methods [FEM]
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- General Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
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- Design And Manufacture Of Integrated Circuits (AREA)
Abstract
The invention discloses a kind of domain DRC processing methods of integrated circuit conversion process, comprising: the territory unit that the design library of A. export A technique needs to modify to GDS file X checks GDS file X using the DRC inspection of B technique;B. the layer set C for meeting inspection in GDS file X and ungratified layer set D are filtered out;C. the design library for creating B technique, imported into the CELL E in the design library of B technique for the layer set C in the GDS file X;D. the layer set D to the DRC for meeting B technique adjusted in GDS file X is checked, and is output to GDS file Y;Method of the invention can handle the domain DRC problem of integrated circuit conversion manufacturing process with mass, avoid repainting domain or one by one artificial treatment DRC, working efficiency is greatly improved.
Description
Technical field
The present invention relates to integrated circuit back-end design field, in particular to a kind of domain of integrated circuit conversion process
DRC processing method.
Background technique
In hybrid digital-analog integrated circuit design process, considers to reduce digital circuit power consumption and area etc., can encounter
It needs ready-made entire design being transformed into the problem of being redesigned in smaller characteristic size technique.In general, digital section
The design for dividing domain that can be quickly completed conversion process by APR, but the domain modification after analog portion domain conversion process
Become extremely complex, hundreds of DRC problem can be encountered, but is all often some simple spacing and line width problem.It can be with
Again simulation layout design is carried out with B technique, or modified one by one for DRC problem, but both methods requires
It takes a significant amount of time and energy, is unable to complete in a short time.
Summary of the invention
It is insufficient in above-mentioned background technique the purpose of the present invention is overcoming, a kind of domain of integrated circuit conversion process is provided
DRC processing method can be handled the domain DRC problem of integrated circuit conversion manufacturing process with mass, avoid repainting domain
Or artificial treatment DRC one by one, working efficiency is greatly improved.
In order to reach above-mentioned technical effect, the present invention takes following technical scheme:
A kind of domain DRC processing method of integrated circuit conversion process, comprising the following steps:
A. the design library for exporting A technique needs the territory unit modified to GDS file (graph data stream file) X, uses B
The DRC inspection of technique is designed regular inspection to GDS file X;
B. the layer set C for meeting DRC inspection in GDS file X and the layer set D for being unsatisfactory for DRC inspection are filtered out;
C. the design library for creating B technique, the layer set C in the GDS file X is imported into the design library of B technique
CELL E;
D. by grammer operation, the layer set D in GDS file X is adjusted, the DRC for being allowed to meet B technique is checked, and defeated
Layer set D adjusted to GDS file Y out;
E. the data in GDS file Y are read in the CELL F in the design library of B technique;
F. merging CELL E and CELL F in the design library of B technique is CELL G;
G. the DRC for executing B technique of the CELL G in the design library of B technique is checked, the process flow if meeting DRC and checking
Terminate.
Further, in the step G further include: return step D continues to adjust if being unsatisfactory for DRC and checking, until full
Until sufficient DRC is checked.
Compared with prior art, the present invention have it is below the utility model has the advantages that
The domain DRC processing method of integrated circuit conversion process of the invention can handle integrated circuit conversion with mass
The domain DRC problem of manufacturing process, avoids repainting domain or one by one artificial treatment DRC, working efficiency can be greatly improved.
Detailed description of the invention
Fig. 1 is the flow diagram of the domain DRC processing method of integrated circuit conversion process of the invention.
Fig. 2 is the schematic diagram that the layer in one embodiment of the present of invention for DRC mistake processes.
Specific embodiment
Below with reference to the embodiment of the present invention, the invention will be further elaborated.
Embodiment:
Embodiment one:
As shown in Figure 1, a kind of domain DRC processing method of integrated circuit conversion process, comprising the following steps:
Step 1: the territory unit that the design library of export A technique needs to modify to GDS file (graph data stream file) X,
Regular inspection is designed to GDS file X using the DRC inspection of B technique;
Step 2: the layer set C for meeting DRC inspection in GDS file X and the layer for being unsatisfactory for DRC inspection are filtered out
Set D;
Step 3: the layer set C in the GDS file X is imported into setting for B technique by the design library of newly-built B technique
Count the CELL E in library;
Step 4: by grammer operation, adjusting the layer set D in GDS file X, is allowed to meet the DRC inspection of B technique
It looks into, and the layer set D to GDS file Y after output adjustment;
Specifically, as shown in Fig. 2, there are following errors: fixed by the contact in layer set D in the present embodiment
Contact size is 0.16um, the contact size in domain are 0.22um, will be especially by script in this this method
Contact size diminution 0.03 is obtained into modified layer contact, size 0.16um.Similarly by layer set D
In other layer do similar processing, be allowed to meet DRC requirement, be then output to GDS file Y.
Specifically, for realizing the core code of the script of automatic batchization processing figure layer in the present embodiment are as follows:
LAYOUT PRIMARY"test1"
LAYOUT PATH"test1.gds"
LAYOUT SYSTEM GDSII
TEXT DEPTH PRIMARY//1
DRC RESULTS DATABASE"test_dummy.gds"GDSII_grow USER MERGED
DRC SUMMARY REPORT"calibre_drc.rep"
DRC MAXIMUM RESULTS ALL
DRC INCREMENTAL CONNECT YES
DRC MAP TEXT YES
MASK RESULTS DATABASE"mask.db"
PRECISION 1000
RESOLUTION 5
UNIT CAPACITANCE F
UNIT RESISTANCE OHM
UNIT LENGTH U
Layer CT 50 0
CT_1=size CT by-0.03
CT_print{
Copy CT_1
}
Drc check map CT_print GDSII 50MAXIMUM RESULTS ALL
Meanwhile it is above-mentioned for directlying adopt existing grammer operation to the layer set D grammer operation being adjusted
It realizes, the grammer operation used in the present embodiment specifically: calibre SVRF.
Step 5: the data in GDS file Y are read in the CELL F in the design library of B technique;
Step 6: merging CELL E and CELL F in the design library of B technique is CELL G;
Step 7: the DRC for executing B technique of the CELL G in the design library of B technique is checked, if meeting DRC and checking
Reason process terminates;Return step four continues to adjust if being unsatisfactory for DRC and checking, until meeting DRC and checking.
In summary, the domain processing method of integrated circuit conversion process of the present invention, by domain number to be treated
Classification is done according to level to import, and is first imported correct level, then after the level that there are problems that DRC is done mass processing with script
It reads in again, all levels for finally merging two set complete treatment process.It can effectively improve working efficiency to avoid one by one
Modification DRC mistake repaints domain.
It is understood that the principle that embodiment of above is intended to be merely illustrative of the present and the exemplary implementation that uses
Mode, however the present invention is not limited thereto.For those skilled in the art, essence of the invention is not being departed from
In the case where mind and essence, various changes and modifications can be made therein, these variations and modifications are also considered as protection scope of the present invention.
Claims (2)
1. a kind of domain DRC processing method of integrated circuit conversion process, which comprises the following steps:
A. the territory unit that the design library of export A technique needs to modify is checked using the DRC of B technique to the GDS to GDS file X
File X is designed regular inspection;
B. the layer set C for meeting DRC inspection in GDS file X and the layer set D for being unsatisfactory for DRC inspection are filtered out;
C. the design library for creating B technique, the layer set C in the GDS file X is imported into the design library of B technique
CELL E;
D. by grammer operation, the layer set D in GDS file X is adjusted, the DRC for being allowed to meet B technique is checked, and exports tune
Layer set D to GDS file Y after whole;
E. the data in GDS file Y are read in the CELL F in the design library of B technique;
F. merging CELL E and CELL F in the design library of B technique is CELL G;
G. the DRC for executing B technique of the CELL G in the design library of B technique is checked, the process flow knot if meeting DRC and checking
Beam.
2. a kind of domain DRC processing method of integrated circuit conversion process according to claim 1, which is characterized in that institute
It states in step G further include: return step D continues to adjust if being unsatisfactory for DRC and checking, until meeting DRC and checking.
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN113792525A (en) * | 2021-11-16 | 2021-12-14 | 北京芯愿景软件技术股份有限公司 | Integrated circuit layout design method, device and equipment |
CN116757145A (en) * | 2023-08-16 | 2023-09-15 | 合肥奎芯集成电路设计有限公司 | Integrated circuit design layout processing method and device, electronic equipment and storage medium |
Citations (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101071272A (en) * | 2006-05-10 | 2007-11-14 | 中芯国际集成电路制造(上海)有限公司 | Method for seeking target area for integrated circuit layout design |
US20070283307A1 (en) * | 2006-05-31 | 2007-12-06 | Kabushiki Kaisha Toshiba | Layout making equipment of semiconductor integrated circuit, method of making layout of semiconductor integrated circuit and process of manufacture of semiconductor device |
CN102446230A (en) * | 2010-10-11 | 2012-05-09 | 上海华虹Nec电子有限公司 | Method for merging GDSII layout data |
CN102760651A (en) * | 2012-07-26 | 2012-10-31 | 上海宏力半导体制造有限公司 | Layout logic-operation method for vertical and shallow injection layers and integrated circuit manufacturing method |
CN102760650A (en) * | 2012-07-26 | 2012-10-31 | 上海宏力半导体制造有限公司 | Layout logical operation method and integrated circuit manufacturing method |
CN103268375A (en) * | 2013-05-08 | 2013-08-28 | 中国科学院微电子研究所 | Checking and verifying method for layout design rule of standard cell library |
CN104424056A (en) * | 2013-08-19 | 2015-03-18 | 上海华虹宏力半导体制造有限公司 | Layer check method for layout data |
CN105426556A (en) * | 2014-09-19 | 2016-03-23 | 北京华大九天软件有限公司 | Visualization analysis method for image layer relation in layout design rule file |
CN105574246A (en) * | 2015-12-14 | 2016-05-11 | 上海华虹宏力半导体制造有限公司 | IP module merging method of layout |
CN106980518A (en) * | 2017-03-23 | 2017-07-25 | 成都锐成芯微科技股份有限公司 | The method that technological design files in batch is checked |
CN107784146A (en) * | 2016-08-31 | 2018-03-09 | 中芯国际集成电路制造(上海)有限公司 | Critical path emulation mode |
CN108121830A (en) * | 2016-11-28 | 2018-06-05 | 深圳市中兴微电子技术有限公司 | A kind of manufacturing method of chip and its device |
CN108256220A (en) * | 2018-01-18 | 2018-07-06 | 上海华虹宏力半导体制造有限公司 | A kind of method for optimizing layout data process flow |
CN109684707A (en) * | 2018-12-19 | 2019-04-26 | 上海华力微电子有限公司 | A kind of standard cell lib layout design rules verification method |
CN109885888A (en) * | 2019-01-23 | 2019-06-14 | 上海华虹宏力半导体制造有限公司 | Chip layout design rule check method |
-
2019
- 2019-07-05 CN CN201910607637.XA patent/CN110321640A/en active Pending
Patent Citations (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101071272A (en) * | 2006-05-10 | 2007-11-14 | 中芯国际集成电路制造(上海)有限公司 | Method for seeking target area for integrated circuit layout design |
US20070283307A1 (en) * | 2006-05-31 | 2007-12-06 | Kabushiki Kaisha Toshiba | Layout making equipment of semiconductor integrated circuit, method of making layout of semiconductor integrated circuit and process of manufacture of semiconductor device |
CN102446230A (en) * | 2010-10-11 | 2012-05-09 | 上海华虹Nec电子有限公司 | Method for merging GDSII layout data |
CN102760651A (en) * | 2012-07-26 | 2012-10-31 | 上海宏力半导体制造有限公司 | Layout logic-operation method for vertical and shallow injection layers and integrated circuit manufacturing method |
CN102760650A (en) * | 2012-07-26 | 2012-10-31 | 上海宏力半导体制造有限公司 | Layout logical operation method and integrated circuit manufacturing method |
CN103268375A (en) * | 2013-05-08 | 2013-08-28 | 中国科学院微电子研究所 | Checking and verifying method for layout design rule of standard cell library |
CN104424056A (en) * | 2013-08-19 | 2015-03-18 | 上海华虹宏力半导体制造有限公司 | Layer check method for layout data |
CN105426556A (en) * | 2014-09-19 | 2016-03-23 | 北京华大九天软件有限公司 | Visualization analysis method for image layer relation in layout design rule file |
CN105574246A (en) * | 2015-12-14 | 2016-05-11 | 上海华虹宏力半导体制造有限公司 | IP module merging method of layout |
CN107784146A (en) * | 2016-08-31 | 2018-03-09 | 中芯国际集成电路制造(上海)有限公司 | Critical path emulation mode |
CN108121830A (en) * | 2016-11-28 | 2018-06-05 | 深圳市中兴微电子技术有限公司 | A kind of manufacturing method of chip and its device |
CN106980518A (en) * | 2017-03-23 | 2017-07-25 | 成都锐成芯微科技股份有限公司 | The method that technological design files in batch is checked |
CN108256220A (en) * | 2018-01-18 | 2018-07-06 | 上海华虹宏力半导体制造有限公司 | A kind of method for optimizing layout data process flow |
CN109684707A (en) * | 2018-12-19 | 2019-04-26 | 上海华力微电子有限公司 | A kind of standard cell lib layout design rules verification method |
CN109885888A (en) * | 2019-01-23 | 2019-06-14 | 上海华虹宏力半导体制造有限公司 | Chip layout design rule check method |
Non-Patent Citations (1)
Title |
---|
郭雅琳等: "VLSI版图DRC验证算法的优化", 《微电子学与计算机》 * |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN113792525A (en) * | 2021-11-16 | 2021-12-14 | 北京芯愿景软件技术股份有限公司 | Integrated circuit layout design method, device and equipment |
CN113792525B (en) * | 2021-11-16 | 2023-02-28 | 北京芯愿景软件技术股份有限公司 | Integrated circuit layout design method, device and equipment |
CN116757145A (en) * | 2023-08-16 | 2023-09-15 | 合肥奎芯集成电路设计有限公司 | Integrated circuit design layout processing method and device, electronic equipment and storage medium |
CN116757145B (en) * | 2023-08-16 | 2024-04-30 | 合肥奎芯集成电路设计有限公司 | Integrated circuit design layout processing method and device, electronic equipment and storage medium |
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Application publication date: 20191011 |