CN105949836A - 一种栅控等离子体引发气相聚合表面涂层的装置及方法 - Google Patents
一种栅控等离子体引发气相聚合表面涂层的装置及方法 Download PDFInfo
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- CN105949836A CN105949836A CN201610319573.XA CN201610319573A CN105949836A CN 105949836 A CN105949836 A CN 105949836A CN 201610319573 A CN201610319573 A CN 201610319573A CN 105949836 A CN105949836 A CN 105949836A
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- phase polymerization
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- face coat
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- 239000002184 metal Substances 0.000 claims abstract description 41
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- 239000001307 helium Substances 0.000 claims description 5
- 229910052734 helium Inorganic materials 0.000 claims description 5
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical group O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 2
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- 229910052799 carbon Inorganic materials 0.000 claims description 2
- 229920001971 elastomer Polymers 0.000 claims description 2
- 125000003700 epoxy group Chemical group 0.000 claims description 2
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- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- JEWCZPTVOYXPGG-UHFFFAOYSA-N ethenyl-ethoxy-dimethylsilane Chemical group CCO[Si](C)(C)C=C JEWCZPTVOYXPGG-UHFFFAOYSA-N 0.000 description 2
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical group COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
- IUHFWCGCSVTMPG-UHFFFAOYSA-N [C].[C] Chemical group [C].[C] IUHFWCGCSVTMPG-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
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- 229920002521 macromolecule Polymers 0.000 description 1
- 239000002103 nanocoating Substances 0.000 description 1
- NZIDBRBFGPQCRY-UHFFFAOYSA-N octyl 2-methylprop-2-enoate Chemical compound CCCCCCCCOC(=O)C(C)=C NZIDBRBFGPQCRY-UHFFFAOYSA-N 0.000 description 1
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/3244—Gas supply means
- H01J37/32449—Gas control, e.g. control of the gas flow
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/52—Polymerisation initiated by wave energy or particle radiation by electric discharge, e.g. voltolisation
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Plasma & Fusion (AREA)
- Physics & Mathematics (AREA)
- General Chemical & Material Sciences (AREA)
- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Wood Science & Technology (AREA)
- Analytical Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Physical Vapour Deposition (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
- Chemical Or Physical Treatment Of Fibers (AREA)
Abstract
Description
Claims (10)
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201610319573.XA CN105949836B (zh) | 2016-05-13 | 2016-05-13 | 一种栅控等离子体引发气相聚合表面涂层的装置及方法 |
US15/762,081 US20180330922A1 (en) | 2016-05-13 | 2016-11-08 | Apparatus and method for surface coating by means of grid control and plasma-initiated gas-phase polymerization |
PCT/CN2016/105126 WO2017193561A1 (zh) | 2016-05-13 | 2016-11-08 | 一种栅控等离子体引发气相聚合表面涂层的装置及方法 |
US16/992,574 US11154903B2 (en) | 2016-05-13 | 2020-08-13 | Apparatus and method for surface coating by means of grid control and plasma-initiated gas-phase polymerization |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201610319573.XA CN105949836B (zh) | 2016-05-13 | 2016-05-13 | 一种栅控等离子体引发气相聚合表面涂层的装置及方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN105949836A true CN105949836A (zh) | 2016-09-21 |
CN105949836B CN105949836B (zh) | 2017-06-16 |
Family
ID=56912347
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201610319573.XA Active CN105949836B (zh) | 2016-05-13 | 2016-05-13 | 一种栅控等离子体引发气相聚合表面涂层的装置及方法 |
Country Status (3)
Country | Link |
---|---|
US (1) | US20180330922A1 (zh) |
CN (1) | CN105949836B (zh) |
WO (1) | WO2017193561A1 (zh) |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106622824A (zh) * | 2016-11-30 | 2017-05-10 | 无锡荣坚五金工具有限公司 | 一种等离子体聚合涂层装置 |
CN107058979A (zh) * | 2017-01-23 | 2017-08-18 | 无锡荣坚五金工具有限公司 | 一种防水耐电击穿涂层的制备方法 |
WO2017193561A1 (zh) * | 2016-05-13 | 2017-11-16 | 无锡荣坚五金工具有限公司 | 一种栅控等离子体引发气相聚合表面涂层的装置及方法 |
WO2020082680A1 (zh) * | 2018-10-24 | 2020-04-30 | 江苏菲沃泰纳米科技有限公司 | 一种聚氨酯纳米涂层及其制备方法 |
CN113275217A (zh) * | 2021-05-18 | 2021-08-20 | 佛山市思博睿科技有限公司 | 等离子体接枝共聚膜层的制备方法 |
US11332829B2 (en) | 2016-11-30 | 2022-05-17 | Jiangsu Favored Nanotechnology Co., LTD | Plasma polymerization coating with uniformity control |
US11339477B2 (en) | 2016-11-30 | 2022-05-24 | Jiangsu Favored Nanotechnology Co., LTD | Plasma polymerization coating apparatus and process |
US20220205103A1 (en) * | 2018-05-04 | 2022-06-30 | Jiangsu Favored Nanotechnology Co., LTD | Nano-coating protection method for electrical devices |
CN114836735A (zh) * | 2021-02-01 | 2022-08-02 | 江苏菲沃泰纳米科技股份有限公司 | 基于icp的等离子体镀膜装置及其方法 |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11154903B2 (en) * | 2016-05-13 | 2021-10-26 | Jiangsu Favored Nanotechnology Co., Ltd. | Apparatus and method for surface coating by means of grid control and plasma-initiated gas-phase polymerization |
CN115505908B (zh) * | 2022-10-08 | 2023-09-05 | 松山湖材料实验室 | 一种dlc层制备装置及制备方法 |
Citations (4)
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US20040070348A1 (en) * | 2001-03-26 | 2004-04-15 | Katsunori Ichiki | Neutral particle beam processing apparatus |
CN1946488A (zh) * | 2004-03-18 | 2007-04-11 | 英国国防部 | 在大容积等离子体室中使用低功率脉冲等离子体来涂布聚合物层 |
CN102024658A (zh) * | 2009-09-22 | 2011-04-20 | 北京北方微电子基地设备工艺研究中心有限责任公司 | 一种等离子体处理设备及方法 |
CN205616834U (zh) * | 2016-05-13 | 2016-10-05 | 无锡荣坚五金工具有限公司 | 一种栅控等离子体引发气相聚合表面涂层的装置 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
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CN1168116C (zh) * | 2000-04-27 | 2004-09-22 | 香港城市大学 | 采用接地导电栅网的直流等离子体离子注入装置 |
US9147581B2 (en) * | 2013-07-11 | 2015-09-29 | Lam Research Corporation | Dual chamber plasma etcher with ion accelerator |
CN105112883B (zh) * | 2015-08-05 | 2017-10-03 | 哈尔滨工业大学 | 偏压调控栅网等离子体浸没离子沉积dlc方法 |
CN105949836B (zh) * | 2016-05-13 | 2017-06-16 | 无锡荣坚五金工具有限公司 | 一种栅控等离子体引发气相聚合表面涂层的装置及方法 |
-
2016
- 2016-05-13 CN CN201610319573.XA patent/CN105949836B/zh active Active
- 2016-11-08 US US15/762,081 patent/US20180330922A1/en not_active Abandoned
- 2016-11-08 WO PCT/CN2016/105126 patent/WO2017193561A1/zh active Application Filing
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20040070348A1 (en) * | 2001-03-26 | 2004-04-15 | Katsunori Ichiki | Neutral particle beam processing apparatus |
CN1946488A (zh) * | 2004-03-18 | 2007-04-11 | 英国国防部 | 在大容积等离子体室中使用低功率脉冲等离子体来涂布聚合物层 |
CN102024658A (zh) * | 2009-09-22 | 2011-04-20 | 北京北方微电子基地设备工艺研究中心有限责任公司 | 一种等离子体处理设备及方法 |
CN205616834U (zh) * | 2016-05-13 | 2016-10-05 | 无锡荣坚五金工具有限公司 | 一种栅控等离子体引发气相聚合表面涂层的装置 |
Cited By (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2017193561A1 (zh) * | 2016-05-13 | 2017-11-16 | 无锡荣坚五金工具有限公司 | 一种栅控等离子体引发气相聚合表面涂层的装置及方法 |
US11332829B2 (en) | 2016-11-30 | 2022-05-17 | Jiangsu Favored Nanotechnology Co., LTD | Plasma polymerization coating with uniformity control |
CN106622824B (zh) * | 2016-11-30 | 2018-10-12 | 江苏菲沃泰纳米科技有限公司 | 一种等离子体聚合涂层装置 |
EP3539676A4 (en) * | 2016-11-30 | 2020-06-24 | Jiangsu Favored Nanotechnology Co., Ltd. | DEVICE FOR PRODUCING A PLASMA-POLYMERIZED COATING |
WO2018098980A1 (zh) * | 2016-11-30 | 2018-06-07 | 江苏菲沃泰纳米科技有限公司 | 一种等离子体聚合涂层装置 |
US11339477B2 (en) | 2016-11-30 | 2022-05-24 | Jiangsu Favored Nanotechnology Co., LTD | Plasma polymerization coating apparatus and process |
US10424465B2 (en) | 2016-11-30 | 2019-09-24 | Jiangsu Favored Nanotechnology Co., LTD | Plasma polymerization coating apparatus |
JP2019537668A (ja) * | 2016-11-30 | 2019-12-26 | 江蘇菲沃泰納米科技有限公司Jiangsu Favored Nanotechnology Co., Ltd | プラズマ重合コーティング装置 |
JP6990704B2 (ja) | 2016-11-30 | 2022-01-12 | 江蘇菲沃泰納米科技股▲分▼有限公司 | プラズマ重合コーティング装置 |
CN106622824A (zh) * | 2016-11-30 | 2017-05-10 | 无锡荣坚五金工具有限公司 | 一种等离子体聚合涂层装置 |
CN107058979A (zh) * | 2017-01-23 | 2017-08-18 | 无锡荣坚五金工具有限公司 | 一种防水耐电击穿涂层的制备方法 |
CN107058979B (zh) * | 2017-01-23 | 2018-05-11 | 江苏菲沃泰纳米科技有限公司 | 一种防水耐电击穿涂层的制备方法 |
US20220205103A1 (en) * | 2018-05-04 | 2022-06-30 | Jiangsu Favored Nanotechnology Co., LTD | Nano-coating protection method for electrical devices |
WO2020082680A1 (zh) * | 2018-10-24 | 2020-04-30 | 江苏菲沃泰纳米科技有限公司 | 一种聚氨酯纳米涂层及其制备方法 |
CN114836735A (zh) * | 2021-02-01 | 2022-08-02 | 江苏菲沃泰纳米科技股份有限公司 | 基于icp的等离子体镀膜装置及其方法 |
CN114836735B (zh) * | 2021-02-01 | 2024-01-19 | 江苏菲沃泰纳米科技股份有限公司 | 基于icp的等离子体镀膜装置及其方法 |
CN113275217A (zh) * | 2021-05-18 | 2021-08-20 | 佛山市思博睿科技有限公司 | 等离子体接枝共聚膜层的制备方法 |
CN113275217B (zh) * | 2021-05-18 | 2022-06-24 | 佛山市思博睿科技有限公司 | 等离子体接枝共聚膜层的制备方法 |
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