CN104710458B - 三(2-二甲基氯乙氧基硅酰氧基乙基)异氰脲酸酯化合物及其制备方法 - Google Patents
三(2-二甲基氯乙氧基硅酰氧基乙基)异氰脲酸酯化合物及其制备方法 Download PDFInfo
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- CN104710458B CN104710458B CN201510100508.3A CN201510100508A CN104710458B CN 104710458 B CN104710458 B CN 104710458B CN 201510100508 A CN201510100508 A CN 201510100508A CN 104710458 B CN104710458 B CN 104710458B
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- isocyanuric acid
- acid esters
- dimethyl chloride
- preparation
- trimethylammonium
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- UUOOAIRCIZPMJT-UHFFFAOYSA-N CN(C)C.[Si+4] Chemical compound CN(C)C.[Si+4] UUOOAIRCIZPMJT-UHFFFAOYSA-N 0.000 title claims abstract description 28
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical class OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 title claims abstract description 22
- 238000002360 preparation method Methods 0.000 title claims abstract description 13
- -1 dimethyl chloride Chemical compound 0.000 claims abstract description 28
- 239000003063 flame retardant Substances 0.000 claims abstract description 25
- 150000007973 cyanuric acids Chemical class 0.000 claims abstract description 23
- 238000006243 chemical reaction Methods 0.000 claims abstract description 21
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 claims abstract description 18
- 238000010792 warming Methods 0.000 claims abstract description 15
- 238000009413 insulation Methods 0.000 claims abstract description 14
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims abstract description 13
- LIKFHECYJZWXFJ-UHFFFAOYSA-N dimethyldichlorosilane Chemical compound C[Si](C)(Cl)Cl LIKFHECYJZWXFJ-UHFFFAOYSA-N 0.000 claims abstract description 11
- 239000007788 liquid Substances 0.000 claims abstract description 10
- 150000001875 compounds Chemical class 0.000 claims abstract description 5
- 239000003960 organic solvent Substances 0.000 claims abstract description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 27
- 229910052757 nitrogen Inorganic materials 0.000 claims description 14
- 229910052710 silicon Inorganic materials 0.000 claims description 14
- 239000010703 silicon Substances 0.000 claims description 13
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 11
- 239000002904 solvent Substances 0.000 claims description 10
- 239000000460 chlorine Substances 0.000 claims description 9
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims description 7
- 229910052801 chlorine Inorganic materials 0.000 claims description 7
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 claims description 6
- 238000000034 method Methods 0.000 claims description 6
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 claims description 5
- 230000002195 synergetic effect Effects 0.000 claims description 5
- SCYULBFZEHDVBN-UHFFFAOYSA-N 1,1-Dichloroethane Chemical class CC(Cl)Cl SCYULBFZEHDVBN-UHFFFAOYSA-N 0.000 claims description 3
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 claims description 3
- 239000003795 chemical substances by application Substances 0.000 claims description 2
- 125000000532 dioxanyl group Chemical group 0.000 claims description 2
- 230000001590 oxidative effect Effects 0.000 claims description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 claims description 2
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 abstract description 15
- 239000000463 material Substances 0.000 abstract description 7
- 239000004800 polyvinyl chloride Substances 0.000 abstract description 5
- 239000004014 plasticizer Substances 0.000 abstract description 4
- 229920000915 polyvinyl chloride Polymers 0.000 abstract description 4
- 239000003822 epoxy resin Substances 0.000 abstract description 3
- 229920000647 polyepoxide Polymers 0.000 abstract description 3
- 229920005989 resin Polymers 0.000 abstract description 3
- 239000011347 resin Substances 0.000 abstract description 3
- 239000004814 polyurethane Substances 0.000 abstract description 2
- 229920002635 polyurethane Polymers 0.000 abstract description 2
- 238000004519 manufacturing process Methods 0.000 abstract 2
- FOVKHTSFPJLUQN-UHFFFAOYSA-N 1-ethoxy-1,3,5-triazinane-2,4,6-trione Chemical class CCON1C(=O)NC(=O)NC1=O FOVKHTSFPJLUQN-UHFFFAOYSA-N 0.000 abstract 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 abstract 1
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 11
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 11
- 238000001035 drying Methods 0.000 description 10
- 238000006073 displacement reaction Methods 0.000 description 5
- 239000001301 oxygen Substances 0.000 description 5
- 229910052760 oxygen Inorganic materials 0.000 description 5
- 238000007789 sealing Methods 0.000 description 5
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 4
- BJQHLKABXJIVAM-UHFFFAOYSA-N bis(2-ethylhexyl) phthalate Chemical compound CCCCC(CC)COC(=O)C1=CC=CC=C1C(=O)OCC(CC)CCCC BJQHLKABXJIVAM-UHFFFAOYSA-N 0.000 description 4
- 239000003610 charcoal Substances 0.000 description 4
- 238000004821 distillation Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 229910052739 hydrogen Inorganic materials 0.000 description 4
- 239000001257 hydrogen Substances 0.000 description 4
- 238000010521 absorption reaction Methods 0.000 description 3
- 239000002994 raw material Substances 0.000 description 3
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 230000007613 environmental effect Effects 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 238000011031 large-scale manufacturing process Methods 0.000 description 2
- 229920000728 polyester Polymers 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 125000006414 CCl Chemical group ClC* 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-DYCDLGHISA-N Deuterium chloride Chemical compound [2H]Cl VEXZGXHMUGYJMC-DYCDLGHISA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- 229910018540 Si C Inorganic materials 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- GHPGOEFPKIHBNM-UHFFFAOYSA-N antimony(3+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Sb+3].[Sb+3] GHPGOEFPKIHBNM-UHFFFAOYSA-N 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 238000009841 combustion method Methods 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 229910021419 crystalline silicon Inorganic materials 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 125000000325 methylidene group Chemical group [H]C([H])=* 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 150000002926 oxygen Chemical class 0.000 description 1
- 230000000505 pernicious effect Effects 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 230000001988 toxicity Effects 0.000 description 1
- 231100000419 toxicity Toxicity 0.000 description 1
- 238000005292 vacuum distillation Methods 0.000 description 1
- DXZMANYCMVCPIM-UHFFFAOYSA-L zinc;diethylphosphinate Chemical compound [Zn+2].CCP([O-])(=O)CC.CCP([O-])(=O)CC DXZMANYCMVCPIM-UHFFFAOYSA-L 0.000 description 1
Abstract
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CN201510100508.3A CN104710458B (zh) | 2015-03-06 | 2015-03-06 | 三(2-二甲基氯乙氧基硅酰氧基乙基)异氰脲酸酯化合物及其制备方法 |
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CN104710458A CN104710458A (zh) | 2015-06-17 |
CN104710458B true CN104710458B (zh) | 2018-07-31 |
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CN107474220B (zh) * | 2017-08-21 | 2019-05-10 | 成都纺织高等专科学校 | 一种含氮、硅、氯本体阻燃环氧树脂及其制备方法 |
CN109370156B (zh) * | 2018-10-19 | 2021-03-09 | 苏州兴业材料科技股份有限公司 | 一种电子级的环氧树脂组合物 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
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CN102174055A (zh) * | 2011-02-23 | 2011-09-07 | 苏州科技学院 | 甲基三(2-氯乙氧基)硅烷化合物及其制备方法 |
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CN102174055A (zh) * | 2011-02-23 | 2011-09-07 | 苏州科技学院 | 甲基三(2-氯乙氧基)硅烷化合物及其制备方法 |
Non-Patent Citations (1)
Title |
---|
阻燃剂赛克三硅酸氯丙酯的合成及应用研究;董信等;《化学世界》;20150125;第37-41页 * |
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Effective date of registration: 20180531 Address after: 313018 No. 188, Liang Shan Road, Linghu Town, Nanxun District, Huzhou, Zhejiang. Applicant after: Huzhou Ruigao New Material Co., Ltd. Address before: 215131 No. 1-2012 Xiangcheng Avenue, Xiangcheng District yuan he street, Suzhou, Jiangsu, 1-2012 Applicant before: Suzhou Yang Qiao Chemical Industry Science Co., Ltd |
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Address after: 313018 No. 188 Liangshan Road, Linghu Town, Nanxun District, Huzhou City, Zhejiang Province Patentee after: Zhejiang Rui hi tech materials Limited by Share Ltd Address before: 313018 No. 188 Liangshan Road, Linghu Town, Nanxun District, Huzhou City, Zhejiang Province Patentee before: Huzhou Ruigao New Material Co., Ltd. |
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Denomination of invention: Tris (2-dimethylchloroethoxysilyloxyethyl) isocyanurate compound and its preparation method Effective date of registration: 20210629 Granted publication date: 20180731 Pledgee: Zhejiang Nanxun Rural Commercial Bank branch Linghu Limited by Share Ltd. Pledgor: Zhejiang Rui hi tech materials Limited by Share Ltd. Registration number: Y2021330000624 |
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Date of cancellation: 20220510 Granted publication date: 20180731 Pledgee: Zhejiang Nanxun Rural Commercial Bank branch Linghu Limited by Share Ltd. Pledgor: Zhejiang Rui hi tech materials Limited by Share Ltd. Registration number: Y2021330000624 |
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