CN103923569B - Preparation method of jade polishing powder - Google Patents

Preparation method of jade polishing powder Download PDF

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Publication number
CN103923569B
CN103923569B CN201410186361.XA CN201410186361A CN103923569B CN 103923569 B CN103923569 B CN 103923569B CN 201410186361 A CN201410186361 A CN 201410186361A CN 103923569 B CN103923569 B CN 103923569B
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polishing powder
water
jade
polishing
chloride
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CN103923569A (en
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李慧芝
许崇娟
陈亚明
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University of Jinan
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University of Jinan
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Abstract

The invention discloses a preparation method of jade polishing powder. The method is characterized by comprising the steps of feeding 12-26% of cerium chloride and 20-32% of zirconium oxychloride into a reactor according to the mass percent concentration, and dissolving the mixture in water; then, feeding 15-30% of aluminium oxide, 8-15% of silicon nitride, 2-6% of chromic oxide and 0.5-3% of dispersing agent into the water solution, and stirring to obtain slurry; dissolving 15-30% of ammonium oxalate into water, and then feeding the product into the slurry, wherein the sum of the content of all the components except water of the slurry is 100%; stirring under the normal pressure, heating up to 85 DEG C, and carrying out a reaction for 30-36h; then, heating up to 120 DEG C, and carrying out the reaction for 2-4h; carrying out calcination for 2-4h at the temperature of 950-1000 DEG C, cooling and crushing by airflow to obtain the jade polishing powder. The preparation technology is simple, easy in control of conditions, low in production cost and easy in industrial production. When being used for the polishing process, the polishing powder is good in powder polishing effect, high in glossiness, free from scratch, high in flatness and less in power dosage.

Description

A kind of preparation method of jade emerald polishing powder
Technical field
What the present invention relates to is a kind of preparing technical field of polishing powder, particularly a kind of jade emerald polishing powder preparation technology and in the polishing of jade emerald.
Background technology
The second half in 19th century, " jade " of China is divided into nephrite and jadeite two class by French mineralogist De Muer.Jadeite, China is commonly called as " emerald ", and being the up-and-coming youngster in China's tradition jade, is again top grade in all jades in modern age.No matter emerald is " mountain material " (primary ore) or " seed material " (secondary ore), mainly by the compact block of jadeite mineral composition.Examine under a microscope, the jadeite mineral closely weave in of composition emerald, forms the filamentary structure of emerald.This filamentary structure closely, makes emerald have fine and smooth and tough and tensile feature.Jadeite is made up of the silicate minerals of a kind of steel and aluminium, and pure person is colourless or white.The chemical composition of its block is: silicon-dioxide accounts for 58.28%, and sodium oxide accounts for 13.94%, and calcium oxide accounts for 1.62%, and magnesium oxide accounts for 0.91%, and ferric oxide accounts for 0.64%, chromium, nickel etc. in addition containing trace.Wherein, chromium makes emerald have emerald principal element.Usual emerald, containing chromic oxide 0.2 ~ 0.5%, reaches more than 2 ~ 3.75% individually.Emerald hardness is 7, proportion 3.33.
The health mechanism of jade confirm by modern science.According to chemical analysis, jade contains the multiple trace element useful to human body, and as zinc, magnesium, iron, copper, selenium, chromium, manganese, cobalt etc., wear jade and trace element can be made to be absorbed by human body skin, active cells tissue, improves the immunologic function of human body.Therefore having the traditional Chinese medical science said " disease had is taken medicine and can not be cured, and often wears jadeware and but reaches a cure ", reason is just this.If wear the long-term optimum massage of jade bracelet, can not only the passive disease except blurred vision, and can vigour be stored, support spirit.Jade not only can beautify the life of people, moulds a person's temperament, and the peace of keeping tie that gets rid of illness.Its product is directly used in having of health: Yuzhen, jade mattress, ball for health, masseur, walking stick, beautiful comb, and have beauty treatment, calmness, the curative effect of calming the nerves to human body, life-time service, can make you in high spirits, promote longevity.
Jade emerald product producing process comprises: cutting → hand hay cutter → engraving tool → punching → mill → carving → sanding and polishing.The quality of jade emerald polishing process quality directly affects the quality of its product, and polishing process is very important in jade emerald production process thus, and polishing powder used in polishing process directly affects the quality of finish of jadeware.
The polishing of jade emerald is an extremely complicated mechanochemical process.In this process, except mechanical effect, also have jade emerald component, chemical action between polishing powder composition and polished die composition.Therefore, in polishing powder system, the change of chemical constitution, changes the adhesive power caused between polished die and jade emerald, also causes changing in work area temperature, polishing powder concentration, finally affects polishing efficiency.Therefore, the chemical constitution of polishing powder is most important to jade ware polishing effect.Jade emerald hardness is comparatively spent high, and the various colors of emerald is colorful, and crystal grain is tiny, even.Highly polished after polished finish, so need polishing powder requirement to have certain degree of hardness at processing jade, soft fine and smooth again.
With regard to polishing powder, different polishing powders has different polishing abilities.Polishing powder is made up of components such as cerium oxide, aluminum oxide, silicon oxide, ferric oxide, zirconium white, chromic oxide, stannic oxide usually, and the hardness of different materials is different, and the chemical property in water is also different, and therefore use occasion is different.The Mohs' hardness of aluminum oxide and chromic oxide is 9, and cerium oxide and zirconium white are 7, and ferric oxide is lower.In jade polishing process, add polishing powder, present people are at aluminium oxide powder or other is as ferric oxide or a certain powder of chromium sesquioxide, namely adopt single abrasive material and single polishing powder to carry out polishing, but the polishing of this single polishing powder to jade does not reach excellent polishing effect.May be that single polishing powder is in polishing friction process.Between the powder of polishing powder, mobility or soft durometer can not be complementary.Several oxide compound is composite can overcome above-mentioned deficiency, a kind of composite polishing powder of polishing of optical element and preparation method and glossing is disclosed in Chinese patent application CN101362925B, be have the chromium sesquioxide of 0.5 part ~ 3 parts and the aluminium sesquioxide of 1.0 parts to form, but the wear resistance of this compound polishing powder does not reach the polishing requirement of emerald.
At present, a lot of mainly polishing powder from rare earth of the report about polishing powder is used for the polishing of lens, sheet glass, eyes, watchcase, precision optical instrument element etc., has the advantages that polishing velocity is fast, precision is high.Since 20th century invention forties polishing powder from rare earth, turnout and application quantity increase year by year, and the production technique of polishing powder from rare earth changes along with the progress of Rare Earth Separation technique.A kind of production method of high-cerium rare-earth polishing powder is disclosed in Chinese patent application CN1939990A; A kind of high precision rare earth polishing powder and preparation method thereof is disclosed in Chinese patent application CN101475777B.
Silicon nitride, chemical formula is Si 3n 4, be a kind of important structured material.It is a kind of superhard material, and itself has oilness, and wear-resistant, is atomic crystal; Anti-oxidant during high temperature, cutting power is comparatively strong, stable chemical nature, and it can also resist thermal shock.The application is by silicon nitride and rare-earth oxidation, aluminum oxide, zirconium white, and chromic oxide prepares a kind of polishing powder for jade polishing, this polishing powder has that hardness is high, good fluidity, soft durometer can not be complementary etc. advantage.
Summary of the invention
The one that is to provide order of the present invention can reduce polishing cut, improve polishing powder gouge hardness, improves preparation method and the technique of the polishing powder of jade smooth finish;
Object of the present invention is achieved through the following technical solutions.
A kind of preparation method of jade emerald polishing powder, be characterised in that the method has following processing step: in the reactor, the Cerium II Chloride of 12% ~ 26% is added by mass percentage concentration, 20% ~ 32% basic zirconium chloride is dissolved in the water, add the aluminium sesquioxide of 15% ~ 30% again, the silicon nitride of 8% ~ 15%, the chromium sesquioxide of 2% ~ 6%, 0.5% ~ 3% dispersion agent agent, stir in slurries, add after again 15% ~ 30% ammonium oxalate being dissolved in water, each component sum is absolutely, water is not counted in component, under normal pressure, stir, add heat 85 DEG C, reaction 30 ~ 36h, Cerium II Chloride is made to generate evengranular Sedemesis, basic zirconium chloride generates evengranular zirconium dioxide particle, solid-liquid separation, evaporating water, again temperature is elevated to 120 DEG C, reaction 2 ~ 4h, at 950 DEG C ~ 1000 DEG C roasting 2 ~ 4h, after cooling, through comminution by gas stream, obtain jade emerald polishing powder, the particle diameter of the jade emerald polishing powder obtained is in the scope of 0.5 ~ 2.5 μm.
In a kind of preparation method of jade emerald polishing powder, described Cerium II Chloride is anhydrous cerium chloride.
In a kind of preparation method of jade emerald polishing powder, described basic zirconium chloride is the basic zirconium chloride containing 8 water.
In a kind of preparation method of jade emerald polishing powder, described aluminium sesquioxide is α-aluminium sesquioxide, and its particle diameter is 0.5 ~ 2.0 μm of scope.
In a kind of preparation method of jade emerald polishing powder, described dispersion agent is tripoly phosphate sodium STPP or polyvinyl alcohol.
In a kind of preparation method of jade emerald polishing powder, described chromium sesquioxide, the particle diameter of silicon carbide are all 0.5 ~ 2.0 μm of scope.
In a kind of preparation method of jade emerald polishing powder, described chloric acid cerium: the mol ratio of ammonium oxalate will between 1:1.6 ~ 2.5.
In a kind of preparation method of jade emerald polishing powder, one of effect of ammonium oxalate is that the pH value of regulation system makes basic zirconium chloride generation precipitated zirconium hydroxide be attached to the surface of solid phase, another effect of ammonium oxalate Cerium II Chloride oxalic cerium is precipitated be attached to the surface of solid phase, excessive ammonium oxalate by thermal degradation on product without impact.
Particle size test method of the present invention is the granularity equivalent diameter size adopting laser particle analyzer to record.
The jade emerald polishing powder method that the present invention obtains: namely may be used for wet throwing and also can be used for dry throwing, during wet throwing, the ratio of powder and water is advisable between 1:1 ~ 2.5, and every square metre of consumption is 20 ~ 40g.
Compared with the prior art, tool has the following advantages and beneficial effect in the present invention:
(1) the present invention obtains jade emerald polishing powder, in preparation process, adopts and adds silicon nitride composition, the polishing gouge hardness of polishing powder is significantly improved, may be used for the polishing of various high rigidity jade emerald.
(2) the present invention obtains jade emerald polishing powder, in preparation process, adding ammonium oxalate is precipitation agent, ammonium oxalate decomposites the pH value that ammonia carrys out regulation system in the process of heating, basic zirconium chloride is made to generate precipitated zirconium hydroxide, oxalic acid is followed and Cerium II Chloride oxalic cerium, and makes System forming precipitation from homogeneous solution (PFHS) system owing to adding ammonium oxalate, after oversintering, generate ZrO 2, CeO 2
Particle fine uniform be distributed in Al 2o 3, Si 3c 4, Cr 2o 3on the surface, there is meso-position radius grain little, the feature that particle size distribution is narrow, between the powder simultaneously making polishing powder mobility or soft durometer complementary, reach better polishing effect.
(3) the present invention obtains jade emerald polishing powder, and preparation technology is simple, and condition is easy to control, and production cost is low, is easy to suitability for industrialized production.
Embodiment
Embodiment 1
A kind of preparation method of jade emerald polishing powder, in the reactor, add the Cerium II Chloride of 20g respectively, 26g basic zirconium chloride is dissolved in the water, add the aluminium sesquioxide of 20g again, the silicon nitride of 10g, the chromium sesquioxide of 3g, the agent of 1.0g dispersion agent, stir in slurries, add after again 20g ammonium oxalate being dissolved in water, under normal pressure, stir, add heat 85 DEG C, reaction 32h, Cerium II Chloride is made to generate evengranular Sedemesis, basic zirconium chloride generates evengranular zirconium dioxide particle, solid-liquid separation, evaporating water, again temperature is elevated to 120 DEG C, reaction 3h, at 950 DEG C of roasting 3h, after cooling, through comminution by gas stream, obtain jade emerald polishing powder.
Embodiment 2
A kind of preparation method of jade emerald polishing powder, in the reactor, add the Cerium II Chloride of 400g respectively, 520g basic zirconium chloride is dissolved in the water, add the aluminium sesquioxide of 400g again, the silicon nitride of 200g, the chromium sesquioxide of 60g, the agent of 20g dispersion agent, stir in slurries, add after again 400g ammonium oxalate being dissolved in water, under normal pressure, stir, add heat 85 DEG C, reaction 32h, Cerium II Chloride is made to generate evengranular Sedemesis, basic zirconium chloride generates evengranular zirconium dioxide particle, solid-liquid separation, evaporating water, again temperature is elevated to 120 DEG C, reaction 3h, at 1000 DEG C of roasting 3h, after cooling, through comminution by gas stream, obtain jade emerald polishing powder.
Embodiment 3
A kind of preparation method of jade emerald polishing powder, in the reactor, add the Cerium II Chloride of 15g respectively, 32g basic zirconium chloride is dissolved in the water, add the aluminium sesquioxide of 15g again, the silicon nitride of 8g, the chromium sesquioxide of 2g, the agent of 0.5g dispersion agent, stir in slurries, add after again 28g ammonium oxalate being dissolved in water, under normal pressure, stir, add heat 85 DEG C, reaction 30h, Cerium II Chloride is made to generate evengranular Sedemesis, basic zirconium chloride generates evengranular zirconium dioxide particle, solid-liquid separation, evaporating water, again temperature is elevated to 120 DEG C, reaction 2h, at 950 DEG C of roasting 4h, after cooling, through comminution by gas stream, obtain jade emerald polishing powder.
Embodiment 4
A kind of preparation method of jade emerald polishing powder, in the reactor, add the Cerium II Chloride of 25g respectively, 20g basic zirconium chloride is dissolved in the water, add the aluminium sesquioxide of 15g again, the silicon nitride of 8g, the chromium sesquioxide of 3g, the agent of 2g dispersion agent, stir in slurries, add after again 27g ammonium oxalate being dissolved in water, under normal pressure, stir, add heat 85 DEG C, reaction 36h, Cerium II Chloride is made to generate evengranular Sedemesis, basic zirconium chloride generates evengranular zirconium dioxide particle, solid-liquid separation, evaporating water, again temperature is elevated to 120 DEG C, reaction 4h, at 1000 DEG C of roasting 3h, after cooling, through comminution by gas stream, obtain jade emerald polishing powder.
Embodiment 5
A kind of preparation method of jade emerald polishing powder, in the reactor, add the Cerium II Chloride of 18g respectively, 22g basic zirconium chloride is dissolved in the water, add the aluminium sesquioxide of 18g again, the silicon nitride of 11g, the chromium sesquioxide of 6g, the agent of 3g dispersion agent, stir in slurries, add after again 22g ammonium oxalate being dissolved in water, under normal pressure, stir, add heat 85 DEG C, reaction 34h, Cerium II Chloride is made to generate evengranular Sedemesis, basic zirconium chloride generates evengranular zirconium dioxide particle, solid-liquid separation, evaporating water, again temperature is elevated to 120 DEG C, reaction 2.5h, at 1000 DEG C of roasting 2.5h, after cooling, through comminution by gas stream, obtain jade emerald polishing powder.
Embodiment 6
A kind of preparation method of jade emerald polishing powder, in the reactor, add the Cerium II Chloride of 130g respectively, 200g basic zirconium chloride is dissolved in the water, add the aluminium sesquioxide of 300g again, the silicon nitride of 150g, the chromium sesquioxide of 40g, the agent of 20g dispersion agent, stir in slurries, add after again 160g ammonium oxalate being dissolved in water, under normal pressure, stir, add heat 85 DEG C, reaction 35h, Cerium II Chloride is made to generate evengranular Sedemesis, basic zirconium chloride generates evengranular zirconium dioxide particle, solid-liquid separation, evaporating water, again temperature is elevated to 120 DEG C, reaction 4h, at 950 DEG C of roasting 4h, after cooling, through comminution by gas stream, obtain jade emerald polishing powder.
Using method: namely may be used for wet throwing and also can be used for dry throwing, wet when throwing by the ratio of polishing powder and water at 1:1 ~ 2.5 furnishing starchiness, wet throwing is selected in suggestion, can pollute because do polishing powder dirt.
The present invention obtains jade emerald polishing powder, and powder polishing effect is good, glossiness, and can reach more than 99 degree, no marking, planeness is high, and the consumption of powder is few.

Claims (1)

1. the preparation method of a jade emerald polishing powder, be characterised in that the method has following processing step: in the reactor, the anhydrous cerium chloride of 12% ~ 26% is added by mass percentage concentration, 20% ~ 32% basic zirconium chloride containing 8 crystal water is dissolved in the water, add the α-aluminium sesquioxide of 15% ~ 30% again, the silicon nitride of 8% ~ 15%, the chromium sesquioxide of 2% ~ 6%, 0.5% ~ 3% dispersion agent, stir in slurries, add after again 15% ~ 30% ammonium oxalate being dissolved in water, each component sum is absolutely, water is not counted in component, under normal pressure, stir, heat 85 DEG C, reaction 30 ~ 36h, Cerium II Chloride is made to generate evengranular Sedemesis, basic zirconium chloride generates evengranular zirconium dioxide particle, solid-liquid separation, evaporating water, again temperature is elevated to 120 DEG C, reaction 2 ~ 4h, at 950 DEG C ~ 1000 DEG C roasting 2 ~ 4h, after cooling, through comminution by gas stream, obtain jade emerald polishing powder, the particle diameter of the jade emerald polishing powder obtained is in the scope of 0.5 ~ 2.5 μm, wherein said dispersion agent is tripoly phosphate sodium STPP or polyvinyl alcohol, the particle diameter of α-aluminium sesquioxide, chromium sesquioxide, carbonitride of silicium is all 0.5 ~ 2.0 μm of scope, anhydrous cerium chloride: the mol ratio of ammonium oxalate will between 1:1.6 ~ 2.5.
CN201410186361.XA 2014-05-06 2014-05-06 Preparation method of jade polishing powder Expired - Fee Related CN103923569B (en)

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Families Citing this family (11)

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Publication number Priority date Publication date Assignee Title
CN104403573A (en) * 2014-11-27 2015-03-11 安顺市西秀区璞玉奇石加工厂 Jade polishing powder
CN104694018B (en) * 2015-03-23 2017-04-19 济南大学 Preparing method for polishing powder used for polishing of zirconium dioxide ceramic
CN104694017B (en) * 2015-03-23 2017-04-19 济南大学 Preparation method of polishing powder for polishing of silicon nitride ceramics
CN105754489B (en) * 2016-05-05 2017-12-26 济南大学 A kind of preparation method of polishing powder for emerald polishing
CN105925199B (en) * 2016-05-05 2017-12-05 济南大学 A kind of preparation method for marble polishing liquid
CN105820760B (en) * 2016-05-05 2017-10-17 济南大学 A kind of polishing liquid and preparation method thereof polished for magnetic disk substrate
CN105860855B (en) * 2016-05-05 2017-09-22 济南大学 A kind of preparation method of boron nitride composite polishing liquid
CN105754490B (en) * 2016-05-05 2017-07-25 济南大学 A kind of preparation method of the polishing powder polished for carnelian
CN106479374A (en) * 2016-10-28 2017-03-08 扬州翠佛堂珠宝有限公司 A kind of jasper polishing fluid
CN106479373A (en) * 2016-10-28 2017-03-08 扬州翠佛堂珠宝有限公司 A kind of emerald polishing fluid
CN106566419A (en) * 2016-10-28 2017-04-19 扬州翠佛堂珠宝有限公司 Jade polishing powder

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1205354A (en) * 1997-07-10 1999-01-20 傅淑贤 Prodn. method of rare-earth polishing powder
CN101899264A (en) * 2009-05-25 2010-12-01 甘肃稀土新材料股份有限公司 Rare earth polishing powder and preparation method thereof
CN102925060A (en) * 2012-11-09 2013-02-13 济南大学 Preparation method of marble composite polishing powder

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7887714B2 (en) * 2000-12-25 2011-02-15 Nissan Chemical Industries, Ltd. Cerium oxide sol and abrasive

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1205354A (en) * 1997-07-10 1999-01-20 傅淑贤 Prodn. method of rare-earth polishing powder
CN101899264A (en) * 2009-05-25 2010-12-01 甘肃稀土新材料股份有限公司 Rare earth polishing powder and preparation method thereof
CN102925060A (en) * 2012-11-09 2013-02-13 济南大学 Preparation method of marble composite polishing powder

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