CA2165069A1 - Device for Coating Substrates in Semiconductor Manufacture - Google Patents

Device for Coating Substrates in Semiconductor Manufacture

Info

Publication number
CA2165069A1
CA2165069A1 CA2165069A CA2165069A CA2165069A1 CA 2165069 A1 CA2165069 A1 CA 2165069A1 CA 2165069 A CA2165069 A CA 2165069A CA 2165069 A CA2165069 A CA 2165069A CA 2165069 A1 CA2165069 A1 CA 2165069A1
Authority
CA
Canada
Prior art keywords
coating substrates
semiconductor manufacture
coating
substrates
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CA2165069A
Other languages
French (fr)
Other versions
CA2165069C (en
Inventor
Eberhard Muhlfriedel
Martin Kallis
Karl Appich
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
HamaTech APE GmbH and Co KG
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority claimed from PCT/DE1993/000778 external-priority patent/WO1995005901A1/en
Publication of CA2165069A1 publication Critical patent/CA2165069A1/en
Application granted granted Critical
Publication of CA2165069C publication Critical patent/CA2165069C/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/6715Apparatus for applying a liquid, a resin, an ink or the like
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • B05C11/02Apparatus for spreading or distributing liquids or other fluent materials already applied to a surface ; Controlling means therefor; Control of the thickness of a coating by spreading or distributing liquids or other fluent materials already applied to the coated surface
    • B05C11/08Spreading liquid or other fluent material by manipulating the work, e.g. tilting
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • B05C11/10Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
    • B05C11/105Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material by capillary action, e.g. using wicks
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C9/00Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important
    • B05C9/08Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying liquid or other fluent material and performing an auxiliary operation
    • B05C9/12Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying liquid or other fluent material and performing an auxiliary operation the auxiliary operation being performed after the application

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Coating Apparatus (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Manufacturing Optical Record Carriers (AREA)

Abstract

The invention concerns a device for coating substrates (20). The coating material is first applied to the substrate (20) by means of a capillary slit (21), and in a subsequent centrifuging operation the film is made uniform and reduced in thickness.
CA002165069A 1993-08-26 1993-08-26 Device for coating substrates in semiconductor manufacture Expired - Lifetime CA2165069C (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/DE1993/000778 WO1995005901A1 (en) 1993-08-26 1993-08-26 Device for coating substrates in semiconductor manufacture

Publications (2)

Publication Number Publication Date
CA2165069A1 true CA2165069A1 (en) 1995-03-02
CA2165069C CA2165069C (en) 1999-06-01

Family

ID=6888393

Family Applications (1)

Application Number Title Priority Date Filing Date
CA002165069A Expired - Lifetime CA2165069C (en) 1993-08-26 1993-08-26 Device for coating substrates in semiconductor manufacture

Country Status (3)

Country Link
KR (1) KR0159247B1 (en)
CA (1) CA2165069C (en)
TW (1) TW335507B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114472090A (en) * 2022-02-10 2022-05-13 华能新能源股份有限公司 Film layer growth equipment and film layer growth method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114472090A (en) * 2022-02-10 2022-05-13 华能新能源股份有限公司 Film layer growth equipment and film layer growth method
CN114472090B (en) * 2022-02-10 2023-06-02 华能新能源股份有限公司 Film growth equipment and film growth method

Also Published As

Publication number Publication date
KR960703684A (en) 1996-08-31
KR0159247B1 (en) 1998-11-16
CA2165069C (en) 1999-06-01
TW335507B (en) 1998-07-01

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Legal Events

Date Code Title Description
EEER Examination request