BR8405362A - Processo para a fabricacao de mascaras para a litografia radiologica - Google Patents

Processo para a fabricacao de mascaras para a litografia radiologica

Info

Publication number: BR8405362A
Authority: BR; Brazil
Prior art keywords: carrier foil; portions; exposed; carrier; litography
Prior art date: 1983-10-25

Application number

BR8405362A

Other languages

English (en)

Inventor

Walter Glashauser

Original Assignee

Siemens Ag

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1983-10-25

Filing date

1984-10-23

Publication date

1985-09-03

1984-10-23 Application filed by Siemens Ag filed Critical Siemens Ag

1985-09-03 Publication of BR8405362A publication Critical patent/BR8405362A/pt

Links

238000000034 method Methods 0.000 title abstract 2
238000004519 manufacturing process Methods 0.000 title 1
239000011888 foil Substances 0.000 abstract 5
PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 abstract 4
238000005530 etching Methods 0.000 abstract 2
239000002184 metal Substances 0.000 abstract 2
229910052751 metal Inorganic materials 0.000 abstract 2
229910052759 nickel Inorganic materials 0.000 abstract 2
238000009713 electroplating Methods 0.000 abstract 1
PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 abstract 1
239000010931 gold Substances 0.000 abstract 1
229910052737 gold Inorganic materials 0.000 abstract 1

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof

Landscapes

Physics & Mathematics (AREA)
General Physics & Mathematics (AREA)
Preparing Plates And Mask In Photomechanical Process (AREA)
Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Analysing Materials By The Use Of Radiation (AREA)
Electron Beam Exposure (AREA)
Physical Vapour Deposition (AREA)

BR8405362A 1983-10-25 1984-10-23 Processo para a fabricacao de mascaras para a litografia radiologica BR8405362A (pt)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
DE19833338717 DE3338717A1 (de)	1983-10-25	1983-10-25	Verfahren zur herstellung einer roentgenmaske mit metalltraegerfolie

Publications (1)

Publication Number	Publication Date
BR8405362A true BR8405362A (pt)	1985-09-03

Family

ID=6212687

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
BR8405362A BR8405362A (pt)	1983-10-25	1984-10-23	Processo para a fabricacao de mascaras para a litografia radiologica

Country Status (8)

Country	Link
US (1)	US4528071A (pt)
EP (1)	EP0141335B1 (pt)
JP (1)	JPS60108851A (pt)
AT (1)	ATE29601T1 (pt)
AU (1)	AU585841B2 (pt)
BR (1)	BR8405362A (pt)
CA (1)	CA1261193A (pt)
DE (2)	DE3338717A1 (pt)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
DE3529966C1 (de) *	1985-08-22	1987-01-15	Kernforschungsz Karlsruhe	Verfahren zur Herstellung von Masken fuer die Roentgentiefenlithographie
JPH0795512B2 (ja) *	1987-05-14	1995-10-11	沖電気工業株式会社	Ｘ線露光マスク用メンブレンの製造方法
DE3806762A1 (de) *	1988-03-02	1989-09-07	Fraunhofer Ges Forschung	Verfahren zur lokalen erhoehung der optischen transparenz von siliziummembranen
KR920010065B1 (ko) *	1989-04-20	1992-11-13	삼성전자 주식회사	X선 마스크
US5477105A (en) *	1992-04-10	1995-12-19	Silicon Video Corporation	Structure of light-emitting device with raised black matrix for use in optical devices such as flat-panel cathode-ray tubes
DE69428821T2 (de) *	1993-03-25	2002-04-11	Sumitomo Electric Industries, Ltd.	Verfahren zur Herstellung einer Mikrostruktur und einer Röntgenstrahlmaske
US6360424B1 (en)	1994-06-06	2002-03-26	Case Western Reserve University	Method of making micromotors with utilitarian features
US6029337A (en) *	1994-06-06	2000-02-29	Case Western Reserve University	Methods of fabricating micromotors with utilitarian features
US5705318A (en) *	1994-06-06	1998-01-06	Case Western Reserve University	Micromotors and methods of fabrication
US5788468A (en) *	1994-11-03	1998-08-04	Memstek Products, Llc	Microfabricated fluidic devices
GB2367788A (en) *	2000-10-16	2002-04-17	Seiko Epson Corp	Etching using an ink jet print head
RU2759387C1 (ru) *	2020-11-11	2021-11-12	Федеральное государственное бюджетное учреждение науки Институт ядерной физики им. Г.И. Будкера Сибирского отделения Российской академии наук (ИЯФ СО РАН)	Способ изготовления самонесущего рентгеношаблона

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US3192136A (en) *	1962-09-14	1965-06-29	Sperry Rand Corp	Method of preparing precision screens
US3342706A (en) *	1964-01-23	1967-09-19	Liben William	Method of constructing evaporation masks
US3476658A (en) *	1965-11-16	1969-11-04	United Aircraft Corp	Method of making microcircuit pattern masks
US3402110A (en) *	1966-01-17	1968-09-17	Zenith Radio Corp	Mask electroforming process
US3449221A (en) *	1966-12-08	1969-06-10	Dynamics Res Corp	Method of making a monometallic mask
US3742230A (en) *	1972-06-29	1973-06-26	Massachusetts Inst Technology	Soft x-ray mask support substrate
DE2425464C3 (de) *	1974-05-27	1978-11-02	Siemens Ag, 1000 Berlin Und 8000 Muenchen	Verfahren zur Herstellung von Dunnschicht-Aperturblenden für Korpuskularstrahlgeräte
DE2512086C3 (de) *	1975-03-19	1978-11-30	Siemens Ag, 1000 Berlin Und 8000 Muenchen	Verfahren zur Herstellung freitragender, dünner Metallstrukturen
US4037111A (en) *	1976-06-08	1977-07-19	Bell Telephone Laboratories, Incorporated	Mask structures for X-ray lithography
DE2626851C3 (de) *	1976-06-15	1982-03-18	Siemens AG, 1000 Berlin und 8000 München	Verfahren zur Herstellung von Masken für die Röntgenlithographie
DE3030742A1 (de) *	1980-08-14	1982-03-25	Philips Patentverwaltung Gmbh, 2000 Hamburg	Verfahren zur herstellung einer maske fuer die strukturerzeugung in lackschichten mittels roentgenstrahlen
JPS57211732A (en) *	1981-06-24	1982-12-25	Toshiba Corp	X ray exposing mask and manufacture thereof
US4515876A (en) *	1982-07-17	1985-05-07	Nippon Telegraph & Telephone Public Corp.	X-Ray lithography mask and method for fabricating the same

1983
- 1983-10-25 DE DE19833338717 patent/DE3338717A1/de not_active Withdrawn
1984
- 1984-10-12 US US06/660,295 patent/US4528071A/en not_active Expired - Fee Related
- 1984-10-16 AT AT84112467T patent/ATE29601T1/de not_active IP Right Cessation
- 1984-10-16 EP EP84112467A patent/EP0141335B1/de not_active Expired
- 1984-10-16 DE DE8484112467T patent/DE3466088D1/de not_active Expired
- 1984-10-19 JP JP59220311A patent/JPS60108851A/ja active Pending
- 1984-10-23 BR BR8405362A patent/BR8405362A/pt not_active IP Right Cessation
- 1984-10-23 CA CA000466092A patent/CA1261193A/en not_active Expired
- 1984-10-24 AU AU34640/84A patent/AU585841B2/en not_active Ceased

Also Published As

Publication number	Publication date
DE3466088D1 (en)	1987-10-15
DE3338717A1 (de)	1985-05-02
AU3464084A (en)	1985-05-02
US4528071A (en)	1985-07-09
AU585841B2 (en)	1989-06-29
ATE29601T1 (de)	1987-09-15
EP0141335B1 (de)	1987-09-09
JPS60108851A (ja)	1985-06-14
EP0141335A1 (de)	1985-05-15
CA1261193A (en)	1989-09-26

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Legal Events

Date	Code	Title	Description
1995-06-27	MM	Lapse due to non-payment of fees (art. 50)